Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 3/20 | 0.54 |
| ▸ | P2RX4 | Q99571 | 5/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | NTRK1 | P04629 | 1/20 | 0.39 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | CASP3 | P42574 | 1/20 | 0.36 |
| ▸ | CASP7 | P55210 | 1/20 | 0.36 |
| ▸ | HTR7 | P34969 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10180072 | 0.93 | PTGS2 (0.45) | PTGS2P2RX4ALDH1A1KDM4EHTR7 | |
| SCHEMBL10180106 | 0.88 | PTGS2 (0.52) | PTGS2P2RX4ALDH1A1NTRK1RXFP1 | |
| SCHEMBL13144175 | 0.82 | P2RX4 (0.61) | PTGS2P2RX4ALDH1A1NTRK1 | |
| SCHEMBL10178700 | 0.81 | HTR7 (0.45) | PTGS2ALDH1A1HTR7NPC1RAB9A | |
| SCHEMBL10178546 | 0.80 | HDAC4 (0.43) | PTGS2P2RX4ALDH1A1KDM4ECASP3 | |
| SCHEMBL6722016 | 0.79 | P2RX4 (0.64) | PTGS2P2RX4ALDH1A1NTRK1RXFP1 | |
| SCHEMBL10178524 | 0.75 | ABCB1 (0.40) | ALDH1A1KDM4ECASP3CASP7NPC1 | |
| SCHEMBL13144176 | 0.74 | LMNA (0.60) | PTGS2P2RX4ALDH1A1POLB | |
| SCHEMBL12732178 | 0.72 | HTR7 (0.52) | KDM4ECASP3CASP7HTR7POLB | |
| SCHEMBL10001830 | 0.71 | TSHR (0.49) | ALDH1A1KDM4ENPC1RAB9APOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |