Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 9/20 | 0.64 |
| ▸ | MAOA | P21397 | 2/20 | 0.62 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.59 |
| ▸ | RXRA | P19793 | 2/20 | 0.59 |
| ▸ | RXRB | P28702 | 2/20 | 0.59 |
| ▸ | HTT | P42858 | 1/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.59 |
| ▸ | HRH3 | Q9Y5N1 | 4/20 | 0.59 |
| ▸ | NPC1 | O15118 | 2/20 | 0.59 |
| ▸ | RAB9A | P51151 | 2/20 | 0.59 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | ADAMTS4 | O75173 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14461904 | 1.00 | MAOB (0.64) | MAOBMAOAL3MBTL1ALDH1A1RXRA | |
| SCHEMBL10178585 | 0.85 | ALDH1A1 (0.67) | MAOBL3MBTL1ALDH1A1RXRARXRB | |
| SCHEMBL10178722 | 0.84 | MAOB (0.64) | MAOBMAOAL3MBTL1ALDH1A1HTT | |
| SCHEMBL765363 | 0.83 | TSHR (0.54) | L3MBTL1ALDH1A1SMN1; SMN2NPC1RAB9A | |
| SCHEMBL27389499 | 0.82 | NPC1 (0.57) | L3MBTL1ALDH1A1RXRARXRBNPC1 | |
| SCHEMBL10178461 | 0.82 | RXRA (0.55) | MAOBL3MBTL1ALDH1A1RXRARXRB | |
| SCHEMBL14866954 | 0.80 | NPC1 (0.55) | MAOBL3MBTL1ALDH1A1RXRARXRB | |
| SCHEMBL15613870 | 0.80 | FFAR1 (0.59) | MAOBL3MBTL1ALDH1A1SMN1; SMN2NPC1 | |
| SCHEMBL14461696 | 0.80 | NPC1 (0.55) | MAOBL3MBTL1ALDH1A1RXRARXRB | |
| SCHEMBL13144203 | 0.79 | TSHR (0.51) | L3MBTL1ALDH1A1NPC1RAB9AHSP90AA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-7445831-B2 | Radiation curable low stress relaxation elastomeric materials | THE PROCTER & GAMBLE COMPANY (US) | 2008-11-04 | — | — | US | disclosed |