Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 16/20 | 0.64 |
| ▸ | MAOA | P21397 | 4/20 | 0.62 |
| ▸ | MRGPRX4 | Q96LA9 | 2/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.51 |
| ▸ | HTT | P42858 | 1/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.51 |
| ▸ | PTPRC | P08575 | 1/20 | 0.50 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | PKM | P14618 | 1/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.50 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.50 |
| ▸ | RELA | Q04206 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10178740 | 0.88 | MRGPRX4 (0.57) | MAOBMRGPRX4SMN1; SMN2ALDH1A1HTT | |
| SCHEMBL10178734 | 0.84 | MRGPRX4 (0.51) | MAOBMRGPRX4SMN1; SMN2PTPRCPTPN1 | |
| SCHEMBL10178588 | 0.84 | MAOB (0.64) | MAOBMAOASMN1; SMN2ALDH1A1HTT | |
| SCHEMBL14461904 | 0.84 | MAOB (0.64) | MAOBMAOASMN1; SMN2ALDH1A1HTT | |
| SCHEMBL10178653 | 0.82 | BCHE (0.53) | MAOBMRGPRX4SMN1; SMN2 | |
| SCHEMBL10178751 | 0.80 | FFAR1 (0.53) | MAOBMRGPRX4 | |
| SCHEMBL10178709 | 0.80 | FFAR1 (0.48) | MRGPRX4 | |
| SCHEMBL15613835 | 0.79 | MAOB (0.54) | MAOBMAOAMRGPRX4SMN1; SMN2HTT | |
| SCHEMBL10178559 | 0.79 | MEN1 (0.48) | MAOBMRGPRX4SMN1; SMN2ALDH1A1L3MBTL1 | |
| SCHEMBL9545816 | 0.78 | MAOB (1.00) | MAOBMAOASMN1; SMN2ALDH1A1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |