SCHEMBL765363

SCHEMBL765363

CCC(C)c1ccc(C(C)=O)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.54
ALDH1A1 P00352 3/20 0.51
KMT2A Q03164 2/20 0.48
NPSR1 Q6W5P4 3/20 0.47
PKM P14618 2/20 0.44
RAB9A P51151 5/20 0.44
NPC1 O15118 3/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
TP53 P04637 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
HPGD P15428 3/20 0.43
MAPT P10636 3/20 0.43
LMNA P02545 2/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
CYP2C9 P11712 1/20 0.43
HDAC8 Q9BY41 1/20 0.43
HDAC6 Q9UBN7 1/20 0.43
POLB P06746 1/20 0.43
NFKB1 P19838 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetophenone SCHEMBL21331970 0.86 ALDH1A1 (0.47) TSHRALDH1A1KMT2ANPSR1PKM
SCHEMBL13144203 0.85 TSHR (0.51) TSHRALDH1A1KMT2ANPSR1RAB9A
SCHEMBL9101659 0.85 ALDH1A1 (0.53) TSHRALDH1A1KMT2ANPSR1PKM
SCHEMBL11600900 0.84 KMT2A (0.45) TSHRALDH1A1KMT2ANPSR1RAB9A
SCHEMBL14549283 0.83 TSHR (0.56) TSHRALDH1A1KMT2ANPSR1RAB9A
SCHEMBL115710 0.83 TSHR (0.56) TSHRALDH1A1KMT2ANPSR1RAB9A
SCHEMBL548540 0.83 KMT2A (0.48) ALDH1A1KMT2ANPSR1PKMRAB9A
SCHEMBL10031628 0.83 TSHR (0.56) TSHRALDH1A1KMT2ANPSR1RAB9A
SCHEMBL10178588 0.83 MAOB (0.64) TSHRALDH1A1RAB9ANPC1SMN1; SMN2
SCHEMBL14461904 0.83 MAOB (0.64) TSHRALDH1A1RAB9ANPC1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230256377-A1 AMINO SORBENTS FOR CAPTURING OF CO2 FROM GAS STREAMS CLIMEWORKS AG (CH) 2023-08-17 US disclosed
US-9869933-B2 Pattern trimming methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-01-16 US disclosed
US-20170255102-A1 PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-09-07 US disclosed
US-20170255103-A1 PATTERN TRIMMING METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-09-07 US disclosed
US-9217919-B2 Photosensitive composition, pattern-forming method using the composition, and resin used in the composition FUJIFILM CORPORATION (JP) 2015-12-22 US disclosed
US-8906600-B2 Resist pattern forming method, resist pattern, positive resist composition, nanoimprint mold and photomask FUJIFILM CORPORATION (JP) 2014-12-09 US disclosed
US-8747750-B2 Fluorescence quenching based oxygen sensor HONEYWELL INTERNATIONAL INC. (US) 2014-06-10 US disclosed
US-8747750-B2 Fluorescence quenching based oxygen sensor HONEYWELL INTERNATIONAL INC. (US) 2014-06-10 US disclosed
US-8642245-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same FUJIFILM CORPORATION (JP) 2014-02-04 US disclosed
US-8507174-B2 Positive resist composition, pattern forming method using the composition, and compound for use in the composition FUJIFILM CORPORATION (JP) 2013-08-13 US disclosed
US-20100071828-A1 METHOD OF PRODUCING MULTILAYER STRUCTURE FUJIFILM CORPORATION (JP) 2010-03-25 US disclosed
US-7638491-B2 Administering a polypeptide having an oxime-containing non-natural amino acid, from a translation system of: a polynucleotide comprising a selector codon encoding the polypeptide, a tRNA comprising the oxime-containing amino acid AMBRX, INC. (US) 2009-12-29 US disclosed
US-20090246685-A1 POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-20090202946-A1 POSITIVE RESIST COMPOSITION FOR USE WITH ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-08-13 US disclosed
US-20090123642-A1 EPOXY RESIN COMPOSITION, CONDUCTIVE FILM FORMING METHOD, CONDUCTIVE PATTERN FORMING METHOD, AND MULTILAYERED WIRING BOARD MANUFACTURING METHOD FUJIFILM CORPORATION (JP) 2009-05-14 US disclosed
US-20090087776-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090047598-A1 RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY, OR EUV, AND PATTERN-FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-02-19 US disclosed
US-20070196327-A1 Nitric oxide releasing polymers AMULET PHARMACEUTICALS, INC. 2007-08-23 US disclosed
WO-2007061139-A1 CELLULOSE ACYLATE FILM, METHOD OF PRODUCING THE SAME, CELLULOSE DERIVATIVE FILM, OPTICALLY COMPENSATORY FILM USING THE SAME, OPTICALLY-COMPENSATORY FILM INCORPORATING POLARIZING PLATE, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2007-05-31 WO disclosed
EP-0398288-B1 Process for preparing optically active 2-arylalkanoic acids, in particular 2-arylpropionic acids PUETTER MEDICE CHEM PHARM (DE) 1995-10-18 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070196327-A1 Nitric oxide releasing polymers NOS2, NOS3, NOS1 TSHR 4116/4885ALDH1A1 2949/4885KMT2A 4313/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.