SCHEMBL10178613

SCHEMBL10178613

CCC(C)c1ccc(COCCOc2ccc(-c3ccccc3)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.46
RAB9A P51151 2/20 0.46
ALDH1A1 P00352 3/20 0.46
TSHR P16473 1/20 0.46
BCHE P06276 1/20 0.43
FFAR1 O14842 2/20 0.43
CHRNB2 P17787 1/20 0.43
CHRNB4 P30926 1/20 0.43
CHRNA3 P32297 1/20 0.43
CHRNA7 P36544 1/20 0.43
CHRNA4 P43681 1/20 0.43
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
HSP90AA1 P07900 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
GSTP1 P09211 1/20 0.42
PPARG P37231 2/20 0.41
PPARD Q03181 1/20 0.41
PPARA Q07869 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9842913 0.88 RXRA (0.49) NPC1RAB9AFFAR1CHRNB2CHRNB4
SCHEMBL6721888 0.88 BCHE (0.55) NPC1RAB9AALDH1A1TSHRBCHE
SCHEMBL14118337 0.88 BCHE (0.55) NPC1RAB9AALDH1A1TSHRBCHE
SCHEMBL10178744 0.86 CHRNB2 (0.40) BCHEFFAR1CHRNB2CHRNB4CHRNA3
SCHEMBL27270853 0.84 GSTP1 (0.54) ALDH1A1FFAR1CHRNB2CHRNB4CHRNA3
SCHEMBL10178650 0.84 ALDH1A1 (0.54) NPC1RAB9AALDH1A1TSHRMEN1
SCHEMBL10178497 0.82 KDM4E (0.51) RAB9AALDH1A1MEN1KMT2ATDP1
SCHEMBL2758498 0.82 ALDH1A1 (0.46) NPC1RAB9AALDH1A1TSHRCHRNB2
SCHEMBL14866849 0.82 APP (0.47) NPC1RAB9AALDH1A1TSHRMEN1
SCHEMBL18195484 0.81 ALDH1A1 (0.60) NPC1RAB9AALDH1A1TSHRCHRNB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed