SCHEMBL10178649

SCHEMBL10178649

CCC(C)c1cccc(CN2CCCC2)c1

nearest known ligand 0.53

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
PRMT6 Q96LA8 1/20 0.53
ALDH1A1 P00352 3/20 0.51
SMN1; SMN2 Q16637 2/20 0.51
TDP1 Q9NUW8 1/20 0.51
KDM4E B2RXH2 1/20 0.48
GAA P10253 1/20 0.48
CYP2D6 P10635 2/20 0.47
CYP2C9 P11712 1/20 0.47
HIF1A Q16665 1/20 0.47
CYP2C19 P33261 1/20 0.44
HDAC4 P56524 1/20 0.43
HDAC2 Q92769 1/20 0.43
HDAC8 Q9BY41 1/20 0.43
HRH3 Q9Y5N1 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24556476 0.87 CYP3A4 (0.43) ALDH1A1SMN1; SMN2TDP1KDM4EGAA
SCHEMBL10142734 0.87 NCF1 (0.56) ALDH1A1SMN1; SMN2KDM4EHRH3
SCHEMBL4547888 0.85 PRMT6 (0.57) PRMT6ALDH1A1SMN1; SMN2TDP1KDM4E
SCHEMBL1619365 0.84 SMN1; SMN2 (0.58) PRMT6ALDH1A1SMN1; SMN2TDP1KDM4E
SCHEMBL1935413 0.83 PRMT6 (0.58) PRMT6ALDH1A1SMN1; SMN2TDP1KDM4E
SCHEMBL19634071 0.82 ALDH1A1 (0.60) PRMT6ALDH1A1SMN1; SMN2TDP1KDM4E
SCHEMBL31010187 0.81 ALDH1A1 (0.63) PRMT6ALDH1A1SMN1; SMN2TDP1KDM4E
SCHEMBL10178474 0.80 HRH3 (0.59) ALDH1A1KDM4ECYP2D6CYP2C19HRH3
SCHEMBL8088259 0.80 PRMT6 (0.51) PRMT6ALDH1A1SMN1; SMN2TDP1KDM4E
SCHEMBL8965571 0.80 PRMT6 (0.51) PRMT6ALDH1A1SMN1; SMN2TDP1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed