Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 5/20 | 0.47 |
| ▸ | CA12 | O43570 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 1/20 | 0.47 |
| ▸ | CA7 | P43166 | 1/20 | 0.47 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.36 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.36 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.36 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.36 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.33 |
| ▸ | MEN1 | O00255 | 3/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | APAF1 | O14727 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8637757 | 0.82 | CA2 (0.61) | CA2CA12CA1CA7CA13 | |
| SCHEMBL10495730 | 0.79 | CA12 (0.47) | CA2CA12CA1CA7CA13 | |
| SCHEMBL846943 | 0.79 | CA2 (0.52) | CA2CA12CA1CA7CA13 | |
| SCHEMBL6278292 | 0.78 | ALDH1A1 (0.55) | ALDH1A1TDP1CHRNB2CHRNB4CHRNA3 | |
| SCHEMBL1024402 | 0.77 | TP53 (0.41) | CA2CA12CA1CA7CA13 | |
| Ethylene Glycol SCHEMBL28139258 | 0.77 | ALDH1A1 (0.69) | ALDH1A1TDP1CHRNB2CHRNB4CHRNA3 | |
| SCHEMBL3900894 | 0.75 | CA2 (0.55) | CA2CA12CA1CA7CA13 | |
| SCHEMBL8529367 | 0.75 | CA2 (0.55) | CA2CA12CA1CA7CA13 | |
| SCHEMBL4757846 | 0.75 | ALDH1A1 (0.41) | ALDH1A1TDP1CHRNB2CHRNB4CHRNA3 | |
| SCHEMBL7319062 | 0.75 | MAOA (0.44) | CA2CA12CA1CA7CA13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8642718-B2 | Curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-02-04 | — | — | US | disclosed |
| EP-1882713-B1 | CURABLE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2013-07-03 | — | — | EP | disclosed |
| US-8394920-B2 | Composition for resin and optical lens obtained therefrom | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-20120082939-A1 | ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120082939-A1 | ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-8013084-B2 | Manufacturing method and apparatus of optical material | SEIKO EPSON CORPORATION (JP) | 2011-09-06 | — | — | US | disclosed |
| CN-101463133-B | Manufacturing method and apparatus of optical material | SEIKO EPSON CORP | 2011-03-02 | — | — | CN | disclosed |
| EP-1398317-B1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2011-01-12 | — | — | EP | disclosed |
| US-20100331515-A1 | COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-12-30 | — | — | US | disclosed |
| EP-2243798-A1 | COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM | Mitsubishi Gas Chemical Company, Inc. (JP) | 2010-10-27 | — | — | EP | disclosed |
| US-7009031-B2 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2006-03-07 | — | — | US | disclosed |
| US-20050154073-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2005-07-14 | — | — | US | disclosed |
| EP-1524289-A1 | POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-04-20 | — | — | EP | disclosed |
| US-6872333-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) | 2005-03-29 | — | — | US | disclosed |
| US-20040254258-A1 | Polymerizable composition, optical material comprising the composition and method for producing the material | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 2004-12-16 | — | — | US | disclosed |
| US-20040158031-A1 | Alicyclic compound for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-08-12 | — | — | US | disclosed |
| EP-1398317-A1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040024165-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-02-05 | — | — | US | disclosed |
| US-20030195270-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2003-10-16 | — | — | US | disclosed |
| EP-1319966-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-06-18 | — | — | EP | disclosed |