SCHEMBL10272965

SCHEMBL10272965

O=C(NC12CC3CC(CC1C3)C2)C(F)(F)S(=O)(=O)O

nearest known ligand 0.40

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 8/20 0.40
CACNA1H O95180 1/20 0.35
EPHX1 P07099 2/20 0.34
ALDH1A1 P00352 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
CNR1 P21554 1/20 0.33
CNR2 P34972 1/20 0.33
DPP4 P27487 1/20 0.33
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL879492 0.82 EPHX2 (0.37) EPHX2CACNA1HEPHX1CNR1CNR2
SCHEMBL10272971 0.82 EPHX2 (0.50) EPHX2EPHX1ALDH1A1LMNA
SCHEMBL16301137 0.75 EPHX2 (0.42) EPHX2CACNA1HEPHX1CNR1CNR2
SCHEMBL24028378 0.73 ALDH1A1 (0.45) EPHX1ALDH1A1CNR2LMNA
SCHEMBL2634441 0.72 ALDH1A1 (0.53) EPHX2ALDH1A1L3MBTL1
SCHEMBL10284599 0.72 ALDH1A1 (0.41) EPHX2EPHX1ALDH1A1CNR1CNR2
SCHEMBL10272628 0.71 ALDH1A1 (0.55) EPHX2ALDH1A1
SCHEMBL10224985 0.71 EPHX2 (0.37) EPHX2CACNA1HEPHX1CNR1CNR2
SCHEMBL25907768 0.70 ALDH1A1 (0.34) ALDH1A1L3MBTL1
SCHEMBL13102829 0.70 ALDH1A1 (0.34) EPHX2EPHX1ALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023579-B2 Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-05-05 US disclosed
US-8647812-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2014-02-11 US disclosed
US-20130011619-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2013-01-10 US disclosed
US-8148044-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2012-04-03 US disclosed
US-20120076996-A1 RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-03-29 US disclosed
US-20100136479-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2010-06-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100136479-A1 POSITIVE PHOTOSENSITIVE COMPOSITION AFF1, F12, AFF2 EPHX2 1401/4885CACNA1H 3249/4885EPHX1 2075/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.