SCHEMBL879492

SCHEMBL879492

O=C(NC12CC3CC(CC1C3)C2)C(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 4/20 0.37
CACNA1H O95180 1/20 0.33
EPHX1 P07099 1/20 0.31
CNR1 P21554 1/20 0.31
CNR2 P34972 1/20 0.31
DPP4 P27487 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10284312 0.84 EPHX2 (0.44) EPHX2EPHX1CNR2
SCHEMBL10272965 0.82 EPHX2 (0.40) EPHX2CACNA1HEPHX1CNR1CNR2
SCHEMBL24028734 0.76 ALDH1A1 (0.41) EPHX1CNR2
SCHEMBL10284317 0.74 ALDH1A1 (0.50) EPHX2
SCHEMBL21011031 0.72
SCHEMBL10284318 0.70 EPHX2 (0.41) EPHX2EPHX1
SCHEMBL10284324 0.70 ALDH1A1 (0.51) EPHX2
SCHEMBL10248477 0.69 SCN9A (0.36)
SCHEMBL21010743 0.69
SCHEMBL10284319 0.69 EPHX2 (0.45) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023579-B2 Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-05-05 US disclosed
US-8557499-B2 Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2013-10-15 US disclosed
US-20120076996-A1 RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-03-29 US disclosed
EP-2434343-A1 Resist composition, resist film therefrom and method of forming pattern therewith Fujifilm Corporation (JP) 2012-03-28 EP disclosed
US-20110008731-A1 ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-01-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110008731-A1 ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION RER1, XRN2, RXRA EPHX2 461/4885CACNA1H 4550/4885EPHX1 755/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.