Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.31 |
| ▸ | FKBP1A | P62942 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4407802 | 0.86 | EPHX1 (0.43) | SMN1; SMN2EPHX1NAAAFKBP1A | |
| SCHEMBL4404941 | 0.85 | EPHX1 (0.46) | SMN1; SMN2EPHX1NAAAFKBP1A | |
| SCHEMBL26459835 | 0.84 | EPHX1 (0.32) | SMN1; SMN2EPHX1NAAA | |
| SCHEMBL13425201 | 0.83 | ALDH1A1 (0.32) | — | |
| SCHEMBL25918245 | 0.83 | SCN9A (0.32) | SMN1; SMN2MAPTEPHX1NAAAFKBP1A | |
| SCHEMBL18557877 | 0.81 | — | — | |
| SCHEMBL2605882 | 0.81 | EPHX1 (0.51) | SMN1; SMN2EPHX1NAAAFKBP1A | |
| SCHEMBL26460052 | 0.81 | EPHX1 (0.34) | SMN1; SMN2EPHX1NAAAFKBP1A | |
| SCHEMBL18799229 | 0.80 | — | — | |
| SCHEMBL13425199 | 0.79 | EPHX1 (0.34) | SMN1; SMN2EPHX1NAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027905-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20230152691-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230123203-A1 | METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND METHOD FOR PRODUCING ONIUM SALT | FUJIFILM CORPORATION (JP) | 2023-04-20 | — | — | US | disclosed |
| US-20210371377-A1 | CARBOXYLATE, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-02 | — | — | US | disclosed |
| US-10766992-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-08 | — | — | US | disclosed |
| US-10719014-B2 | Photoresists comprising amide component | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-07-21 | — | — | US | disclosed |
| US-9822060-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-21 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9726974-B2 | Resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-20120178021-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210371377-A1 | CARBOXYLATE, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | CHRM1, CHRM2, FOXM1 | SMN1; SMN2 1751/4885MAPT 4647/4885EPHX1 2178/4885 |
| US-20230123203-A1 | METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND METHOD FOR PRODUCING ONIUM SALT | PRKAR2B, GRK7, PRKAR2A | SMN1; SMN2 4384/4885MAPT 2851/4885EPHX1 503/4885 |
| US-10719014-B2 | Photoresists comprising amide component | ASPH, ALAD, SUN2 | SMN1; SMN2 4785/4885MAPT 887/4885EPHX1 488/4885 |
| US-20120178021-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SULT1A1, SULT1E1, C1S | SMN1; SMN2 2735/4885MAPT 3262/4885EPHX1 1773/4885 |
| US-20230152691-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | CHRM1, CHRM2, H1-0 | SMN1; SMN2 4076/4885MAPT 4777/4885EPHX1 2516/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.