SCHEMBL10329367

SCHEMBL10329367

C=CCOC(=O)N1C(C)(C)CC(OC(=O)CCCOC(=O)C(=C)C)CC1(C)C

nearest known ligand 0.34

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.34
EPHX2 P34913 1/20 0.31
GAA P10253 2/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
FAAH O00519 1/20 0.30
MGLL Q99685 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10329348 0.87 ALDH1A1 (0.31) ALDH1A1
SCHEMBL10329363 0.85 TSHR (0.32) TSHRMEN1KMT2AALDH1A1
SCHEMBL10329361 0.84 TSHR (0.35) TSHRGAAMEN1KMT2A
SCHEMBL10329368 0.81 TSHR (0.35) TSHR
SCHEMBL10329369 0.81 KMT2A (0.38) TSHREPHX2GAAMEN1KMT2A
SCHEMBL10329353 0.81 SMN1; SMN2 (0.36) TSHRGAAFAAHMGLLALDH1A1
SCHEMBL10329355 0.79 SMN1; SMN2 (0.37) TSHRGAAFAAHMGLLALDH1A1
SCHEMBL9421807 0.72 NAAA (0.39) TSHREPHX2GAAMEN1KMT2A
SCHEMBL16623995 0.72 THRB (0.38) TSHRGAAMEN1KMT2AALDH1A1
SCHEMBL14885808 0.72 THRB (0.38) TSHRGAAMEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, PAM TSHR 4708/4885EPHX2 2743/4885GAA 4155/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.