SCHEMBL10438698

SCHEMBL10438698

O=C1NC(=S)SC1=Cc1ccc([N+](=O)[O-])cc1[N+](=O)[O-]

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CRHBP P24387 2/20 0.64
▸ CRHR2 Q13324 2/20 0.64
▸ GSK3B P49841 4/20 0.58
▸ GAA P10253 2/20 0.56
▸ MGAM O43451 1/20 0.56
▸ SI P14410 1/20 0.56
▸ MGAM2 Q2M2H8 1/20 0.56
▸ PIK3CG P48736 3/20 0.55
▸ PIK3CA P42336 1/20 0.55
▸ S100A4 P26447 1/20 0.52
▸ CASP7 P55210 2/20 0.52
▸ CASP9 P55211 2/20 0.52
▸ CASP6 P55212 2/20 0.52
▸ PTP4A3 O75365 1/20 0.52
▸ TDP2 O95551 1/20 0.52
▸ CASP8 Q14790 1/20 0.52
▸ PIM1 P11309 1/20 0.51
▸ IDH1 O75874 1/20 0.51
▸ MEN1 O00255 1/20 0.50
▸ APAF1 O14727 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13499573 0.86 CRHBP (0.68) CRHBPCRHR2GSK3BGAAMGAM
SCHEMBL13499588 0.85 CRHBP (0.70) CRHBPCRHR2GSK3BGAAMGAM
SCHEMBL13499587 0.84 CRHBP (0.62) CRHBPCRHR2GSK3BGAAMGAM
SCHEMBL8310830 0.83 TDP2 (0.75) CRHBPCRHR2GSK3BCASP7CASP9
SCHEMBL8310829 0.83 TDP2 (0.75) CRHBPCRHR2GSK3BCASP7CASP9
SCHEMBL13499570 0.81 MGAM (0.66) CRHBPCRHR2GSK3BGAAMGAM
SCHEMBL15091291 0.80 CRHBP (0.71) CRHBPCRHR2GSK3BIDH1CA2
SCHEMBL1250835 0.80 CRHBP (0.71) CRHBPCRHR2GSK3BIDH1CA2
SCHEMBL1250831 0.80 CRHBP (0.71) CRHBPCRHR2GSK3BIDH1CA2
SCHEMBL2065485 0.79 CRHBP (0.72) CRHBPCRHR2GSK3BGAAMGAM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0401846-A2 A direct positive silver halide photographic light-sensitive material and a processing method therefor KONICA CORPORATION (JP) 1990-12-12 — — EP disclosed
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