SCHEMBL10452008

SCHEMBL10452008

O=C(CCc1cc(CO)c(O)c(CO)c1)CCc1cc(CO)c(O)c(CO)c1

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.48
CASP6 P55212 1/20 0.48
ALOX5 P09917 3/20 0.44
SHBG P04278 1/20 0.42
NFKB1 P19838 1/20 0.41
NFKB2 Q00653 1/20 0.41
RELA Q04206 1/20 0.41
IAPP P10997 6/20 0.41
PKM P14618 1/20 0.36
OR51E2 Q9H255 1/20 0.34
GAA P10253 1/20 0.34
SELL P14151 1/20 0.34
SELP P16109 1/20 0.34
SELE P16581 1/20 0.34
TRPA1 O75762 1/20 0.34
ALDH1A1 P00352 1/20 0.33
HPGD P15428 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9973601 0.84 ALDH1A1 (0.47) KDM4ECASP6ALOX5SHBGNFKB1
SCHEMBL216792 0.74 KDM4E (0.70) KDM4ECASP6SHBGPKMALDH1A1
SCHEMBL4452928 0.74 SHBG (0.50) KDM4ECASP6ALOX5SHBGPKM
SCHEMBL28260165 0.73 IAPP (0.59) ALOX5IAPP
SCHEMBL28157467 0.73 LTA4H (0.50) KDM4EALOX5NFKB1NFKB2RELA
SCHEMBL27986826 0.72 PTGS1 (0.50) ALOX5SHBGNFKB1NFKB2RELA
Acetic Acid SCHEMBL9330895 0.72 KDM4E (0.61) KDM4ECASP6SHBGPKMALDH1A1
SCHEMBL2679190 0.72 SHBG (0.71) KDM4ECASP6SHBGPKMALDH1A1
SCHEMBL12599491 0.72 IAPP (0.71) ALOX5IAPPPKMOR51E2
SCHEMBL17306533 0.71 ALOX5 (0.55) ALOX5NFKB1NFKB2RELAPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090119-B2 Pattern forming method JSR CORPORATION (JP) 2015-07-28 US disclosed
US-9090119-B2 Pattern forming method JSR CORPORATION (JP) 2015-07-28 US disclosed
US-20140224765-A1 PATTERN FORMING METHOD JSR CORPORATION (JP) 2014-08-14 US disclosed
US-20140224765-A1 PATTERN FORMING METHOD JSR CORPORATION (JP) 2014-08-14 US disclosed
US-20120181251-A1 PATTERN FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION JSR CORPORATION (JP) 2012-07-19 US disclosed
US-20120181251-A1 PATTERN FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION JSR CORPORATION (JP) 2012-07-19 US disclosed