Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1061806 | 0.80 | ALDH1A1 (0.36) | TSHRKCNN4KMT2AMAPTALDH1A1 | |
| SCHEMBL20565712 | 0.78 | MEN1 (0.41) | TSHRKMT2AMAPTALDH1A1NPC1 | |
| SCHEMBL23630893 | 0.75 | ALDH1A1 (0.44) | TSHRALDH1A1 | |
| SCHEMBL453984 | 0.75 | ALDH1A1 (0.32) | TSHRALDH1A1 | |
| SCHEMBL1062321 | 0.70 | — | — | |
| SCHEMBL27957588 | 0.70 | TRPA1 (0.39) | MAPTSMN1; SMN2 | |
| SCHEMBL21327983 | 0.70 | ALDH1A1 (0.35) | MAPTALDH1A1 | |
| SCHEMBL57086 | 0.65 | ALDH1A1 (0.46) | TSHRKMT2AALDH1A1 | |
| SCHEMBL29110555 | 0.64 | TSHR (0.34) | TSHRKCNN4KMT2ACA4MAPT | |
| SCHEMBL28547612 | 0.62 | LMNA (0.30) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12504687-B2 | Curable photosensitive resin composition, cured product, resist pattern, method of producing resist pattern, semiconductor device and electronic device | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 2025-12-23 | — | — | US | disclosed |
| US-12296325-B2 | Catalyst for hydrosilylation reaction, hydrogenation reaction, and hydrosilane reduction reaction | KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION (JP) | 2025-05-13 | — | — | US | disclosed |
| CN-117098824-A | Adhesive composition, laminate, method for producing laminate, and method for producing processed substrate | 日产化学株式会社 | 2023-11-21 | — | — | CN | disclosed |
| US-20230241594-A1 | CATALYST FOR HYDROSILYLATION REACTION, HYDROGENATION REACTION, AND HYDROSILANE REDUCTION REACTION | KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION (JP) | 2023-08-03 | — | — | US | disclosed |
| CN-116508132-A | Laminate, method for producing laminate, and method for producing semiconductor substrate | 日产化学株式会社 | 2023-07-28 | — | — | CN | disclosed |
| EP-3590596-B1 | CATALYST FOR HYDROSILYLATION REACTION, HYDROGENATION REACTION, AND HYDROSILANE REDUCTION REACTION | UNIV KYUSHU NAT UNIV CORP (JP) | 2023-07-12 | — | — | EP | disclosed |
| CN-115877658-A | Curable photosensitive resin composition, cured product, resist pattern and method for producing same, semiconductor element, and electronic device | 荒川化学工业株式会社 | 2023-03-31 | — | — | CN | disclosed |
| US-20230101181-A1 | CURABLE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, RESIST PATTERN, METHOD OF PRODUCING RESIST PATTERN, SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE | ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) | 2023-03-30 | — | — | US | disclosed |
| EP-3689891-B1 | COBALT COMPLEX, PRODUCTION METHOD THEREFOR, AND CATALYST FOR HYDROSILYLATION REACTION | UNIV KYUSHU NAT UNIV CORP (JP) | 2023-03-01 | — | — | EP | disclosed |
| US-20220401938-A1 | CATALYST FOR HYDROSILYLATION REACTION, HYDROGENATION REACTION, AND HYDROSILANE REDUCTION REACTION | KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION (JP) | 2022-12-22 | — | — | US | disclosed |
| US-20190235383-A1 | PHOTOSENSITIVE COMPOSITION, COLORED PATTERN AND METHOD FOR PRODUCING SAME | KANEKA CORPORATION (JP) | 2019-08-01 | — | — | US | disclosed |
| EP-3514626-A1 | PHOTOSENSITIVE COMPOSITION, COLORED PATTERN AND METHOD FOR PRODUCING SAME | Kaneka Corporation (JP) | 2019-07-24 | — | — | EP | disclosed |
| EP-3406616-A1 | NOVEL ISOCYANIDE COMPOUND AND HYDROSILYLATION REACTION CATALYST | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-11-28 | — | — | EP | disclosed |
| US-9464172-B2 | Alkali-developable curable composition, insulating thin film using the same, and thin film transistor | KANEKA CORPORATION (JP) | 2016-10-11 | — | — | US | disclosed |
| US-8809458-B2 | Polysiloxane composition | KANEKA CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| EP-2236543-B1 | POLYSILOXANE COMPOUND, ALKALI-DEVELOPABLE CURABLE COMPOSITION, INSULATING THIN FILM USING THE SAME, AND THIN FILM TRANSISTOR | KANEKA CORP (JP) | 2014-02-26 | — | — | EP | disclosed |
| US-20110001190-A1 | ALKALI-DEVELOPABLE CURABLE COMPOSITION, INSULATING THIN FILM USING THE SAME, AND THIN FILM TRANSISTOR | KANEKA CORPORATION (JP) | 2011-01-06 | — | — | US | disclosed |
| EP-2236543-A1 | ALKALI-DEVELOPABLE CURABLE COMPOSITION, INSULATING THIN FILM USING THE SAME, AND THIN FILM TRANSISTOR | Kaneka Corporation (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-20100063221-A1 | POLYSILOXANE COMPOSITION | KANEKA CORPORATION | 2010-03-11 | — | — | US | disclosed |
| EP-0185526-B1 | SOLVENT SOLUBLE FLUORINE-CONTAINING POLYMER, COATING COMPOSITION CONTAINING THE SAME AND COATING PROCESS THEREOF | MITSUI SEKIYU KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1991-03-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12296325-B2 | Catalyst for hydrosilylation reaction, hydrogenation reaction, and hydrosilane reduction reaction | H1-0, HVCN1, H1-2 | TSHR 2660/4885KCNN4 393/4885KMT2A 1314/4885 |
| US-20110001190-A1 | ALKALI-DEVELOPABLE CURABLE COMPOSITION, INSULATING THIN FILM USING THE SAME, AND THIN FILM TRANSISTOR | TET1, KDM4A, ASIC1 | TSHR 4666/4885KCNN4 171/4885KMT2A 90/4885 |
| US-20230241594-A1 | CATALYST FOR HYDROSILYLATION REACTION, HYDROGENATION REACTION, AND HYDROSILANE REDUCTION REACTION | H1-0, HVCN1, H1-2 | TSHR 2660/4885KCNN4 393/4885KMT2A 1314/4885 |
| US-20220401938-A1 | CATALYST FOR HYDROSILYLATION REACTION, HYDROGENATION REACTION, AND HYDROSILANE REDUCTION REACTION | H1-0, HVCN1, H1-2 | TSHR 2664/4885KCNN4 392/4885KMT2A 1306/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.