SCHEMBL1055776

SCHEMBL1055776

C=CC1(C=C)CC[Si](c2ccccc2)(c2ccccc2)OC1(c1ccccc1)c1ccccc1

nearest known ligand 0.32

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TET3 O43151 1/20 0.30
KMT2A Q03164 1/20 0.30
FBXL19 Q6PCT2 1/20 0.30
CXXC5 Q7LFL8 1/20 0.30
TET1 Q8NFU7 1/20 0.30
KDM2B Q8NHM5 1/20 0.30
CXXC4 Q9H2H0 1/20 0.30
KDM2A Q9Y2K7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2369738 0.80
SCHEMBL5488952 0.80 OPRM1 (0.31)
SCHEMBL28711657 0.76 AKR1C1 (0.30)
SCHEMBL2232615 0.76 OPRM1 (0.35)
SCHEMBL27898023 0.76 TET3 (0.30) TET3KMT2AFBXL19CXXC5TET1
SCHEMBL28026738 0.71 DRD4 (0.30)
SCHEMBL28269509 0.70
SCHEMBL28946258 0.69 GRIN2D (0.38)
SCHEMBL29035536 0.68
SCHEMBL335740 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210171770-A1 RESIN COMPOSITION AND ARTICLE MADE THEREFROM ELITE ELECTRONIC MATERIAL (ZHONGSHAN) CO., LTD. (CN) 2021-06-10 US disclosed
US-8637225-B2 Magnetic recording medium and magnetic recording/reproducing apparatus SHOWA DENKO K.K. (JP) 2014-01-28 US disclosed
US-20130307195-A1 CURABLE COMPOSITION FOR TRANSFER MATERIALS AND METHOD FOR FORMING MICROPATTERN USING THE CURABLE COMPOSITION SHOWA DENKO K.K. (JP) 2013-11-21 US disclosed
CN-101978420-B Method for producing magnetic recording medium, magnetic recording medium and magnetic recording/reproducing apparatus SHOWA DENKO KK 2013-06-05 CN disclosed
US-20110129689-A2 CURABLE COMPOSITION FOR TRANSFER MATERIALS AND METHOD FOR FORMING MICROPATTERN USING THE CURABLE COMPOSITION SHOWA DENKO K.K. (JP) 2011-06-02 US disclosed
CN-101978420-A Method for producing magnetic recording medium, magnetic recording medium and magnetic recording/reproducing apparatus SHOWA DENKO KK 2011-02-16 CN disclosed
US-20110019307-A1 METHOD FOR PRODUCING MAGNETIC RECORDING MEDIUM, MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING/REPRODUCING APPARATUS SHOWA DENKO K.K. (JP) 2011-01-27 US disclosed
US-20100316889-A1 CURABLE COMPOSITION FOR TRANSFER MATERIALS AND METHOD FOR FORMING MICROPATTERN USING THE CURABLE COMPOSITION SHOWA DENKO K.K. (JP) 2010-12-16 US disclosed
CN-101883797-A Curable composition for transfer materials and method for forming micropattern using the curable composition SHOWA DENKO KK 2010-11-10 CN disclosed