SCHEMBL28946258

SCHEMBL28946258

NCCCC1(CCCN)CC[Si](c2ccccc2)(c2ccccc2)OC1(c1ccccc1)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 2/20 0.38
GRIN3B O60391 2/20 0.38
GRIA1 P42261 2/20 0.38
GRIA2 P42262 2/20 0.38
GRIA3 P42263 2/20 0.38
GRIA4 P48058 2/20 0.38
GRIN1 Q05586 2/20 0.38
GRIN2A Q12879 2/20 0.38
GRIN2B Q13224 2/20 0.38
GRIN2C Q14957 2/20 0.38
GRIN3A Q8TCU5 2/20 0.38
MAOA P21397 1/20 0.33
MAOB P27338 1/20 0.33
TAAR1 Q96RJ0 1/20 0.33
DPP4 P27487 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28946262 0.81 OPRM1 (0.31)
SCHEMBL28711657 0.72 AKR1C1 (0.30)
SCHEMBL2232615 0.72 OPRM1 (0.35)
SCHEMBL1055776 0.69 TET3 (0.30)
SCHEMBL7747037 0.67 MAOB (0.35) GRIN2DGRIN3BGRIA1GRIA2GRIA3
SCHEMBL8164179 0.64 GRIN2D (0.33) GRIN2DGRIN3BGRIA1GRIA2GRIA3
SCHEMBL2048192 0.64 OPRM1 (0.36) MAOAMAOBTAAR1DPP4
SCHEMBL953655 0.64 GRIN2D (0.31) GRIN2DGRIN3BGRIA1GRIA2GRIA3
SCHEMBL23748538 0.63 TSHR (0.33)
SCHEMBL2352430 0.62 AKR1C1 (0.35) DPP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116560188-B Photosensitive resin composition, photosensitive resin sheet and application thereof 波米科技有限公司 2024-02-13 CN claimed
CN-115639724-B Preparation method and application of photosensitive resin composition 波米科技有限公司 2023-08-08 CN claimed
CN-116560188-A Photosensitive resin composition, photosensitive resin sheet and application thereof 波米科技有限公司 2023-08-08 CN claimed
CN-115639724-A Preparation method and application of photosensitive resin composition 波米科技有限公司 2023-01-24 CN claimed
CN-116560188-B Photosensitive resin composition, photosensitive resin sheet and application thereof 波米科技有限公司 2024-02-13 CN disclosed
CN-108165281-B Liquid crystal aligning agent and preparation method and application thereof 常州市尚科新材料有限公司 2023-11-24 CN disclosed
CN-115639724-B Preparation method and application of photosensitive resin composition 波米科技有限公司 2023-08-08 CN disclosed
CN-116560188-A Photosensitive resin composition, photosensitive resin sheet and application thereof 波米科技有限公司 2023-08-08 CN disclosed
CN-115639724-A Preparation method and application of photosensitive resin composition 波米科技有限公司 2023-01-24 CN disclosed
CN-111139087-B Liquid crystal photo-alignment agent, liquid crystal photo-alignment film, and preparation method and application thereof 常州市尚科新材料有限公司 2022-12-27 CN disclosed
CN-111139087-A Liquid crystal photo-alignment agent, liquid crystal photo-alignment film, and preparation method and application thereof 常州市尚科新材料有限公司 2020-05-12 CN disclosed