SCHEMBL10603459

SCHEMBL10603459

COc1c(CO)cc(Oc2ccccc2)cc1CO

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ LTA4H P09960 5/20 0.48
▸ RHEB Q15382 3/20 0.43
▸ TSHR P16473 2/20 0.43
▸ MAPT P10636 2/20 0.42
▸ TTR P02766 1/20 0.41
▸ MEN1 O00255 4/20 0.40
▸ KMT2A Q03164 4/20 0.40
▸ CA4 P22748 1/20 0.40
▸ NR1H2 P55055 1/20 0.39
▸ BAX Q07812 1/20 0.39
▸ BCL2A1 Q16548 1/20 0.39
▸ BAZ2B Q9UIF8 1/20 0.39
▸ BAZ2A Q9UIF9 1/20 0.39
▸ ALDH1A1 P00352 3/20 0.39
▸ KDM4E B2RXH2 2/20 0.39
▸ HTT P42858 1/20 0.39
▸ MAPK1 P28482 2/20 0.39
▸ HSD17B10 Q99714 1/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10602430 0.83 LTA4H (0.55) LTA4HRHEBTSHRTTRBAZ2B
SCHEMBL11059929 0.79 LTA4H (0.53) LTA4HRHEBTSHRTTRMEN1
SCHEMBL3692216 0.78 MAPT (0.52) MAPTALDH1A1KDM4EHSD17B10
SCHEMBL20439168 0.75 LTA4H (0.53) LTA4HTSHRTTRMEN1KMT2A
SCHEMBL10600372 0.75 MAPT (0.50) LTA4HMAPT
SCHEMBL2094797 0.73 LTA4H (0.56) LTA4HTSHRTTRMEN1KMT2A
SCHEMBL18538550 0.73 LTA4H (0.56) LTA4HTSHRMAPTMEN1KMT2A
SCHEMBL10728946 0.73 CYP1A2 (0.50) MAPTALDH1A1KDM4E
SCHEMBL2093112 0.73 LTA4H (0.55) LTA4HTSHRTTRNR1H2BAX
SCHEMBL10605015 0.72 KLF10 (0.46) MAPTMEN1KMT2AALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0212482-B1 PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS HOECHST CELANESE CORPORATION (US) 1989-04-19 — — EP disclosed
EP-0212482-A2 Process for obtaining negative images from positive photoresists HOECHST CELANESE CORPORATION (US) 1987-03-04 — — EP disclosed
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