SCHEMBL106514

SCHEMBL106514

Cc1cccc(C(C)O[SiH3])c1C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA2A P08913 5/20 0.42
ADRA2B P18089 5/20 0.42
ADRA2C P18825 5/20 0.42
CYP1A2 P05177 5/20 0.42
CYP3A4 P08684 4/20 0.42
TSHR P16473 4/20 0.42
ADRA1A P35348 3/20 0.42
ADRA1B P35368 3/20 0.42
CYP2D6 P10635 3/20 0.42
ADRA1D P25100 2/20 0.42
KCNH2 Q12809 2/20 0.42
CYP2C9 P11712 2/20 0.42
TP53 P04637 1/20 0.42
CYP2C19 P33261 1/20 0.42
SLC6A2 P23975 2/20 0.41
HTR7 P34969 1/20 0.41
ESR1 P03372 1/20 0.39
TRPA1 O75762 1/20 0.37
ATM Q13315 1/20 0.37
SCN4A P35499 7/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31611894 0.84 ADRA2A (0.40) ADRA2AADRA2BADRA2CCYP1A2CYP3A4
SCHEMBL704522 0.83 ESR1 (0.52) ADRA2AADRA2BADRA2CCYP3A4TSHR
SCHEMBL9069783 0.83 ESR1 (0.46) ADRA2AADRA2BADRA2CCYP1A2CYP3A4
SCHEMBL8427289 0.81 ADRA2A (0.43) ADRA2AADRA2BADRA2CCYP1A2CYP3A4
SCHEMBL1053969 0.77 TSHR (0.55) ADRA2AADRA2BADRA2CCYP1A2CYP3A4
SCHEMBL704366 0.76 ADRA2A (0.37) ADRA2AADRA2BADRA2CCYP1A2CYP3A4
SCHEMBL11004514 0.76 ADRA2A (0.40) ADRA2AADRA2BADRA2CCYP1A2CYP3A4
SCHEMBL8750426 0.76 ADRA2A (0.40) ADRA2AADRA2BADRA2CCYP1A2CYP3A4
SCHEMBL196657 0.75 TSHR (0.50) ADRA2AADRA2BADRA2CCYP1A2CYP3A4
SCHEMBL9453500 0.75 KDM4E (0.41) ADRA2AADRA2BADRA2CCYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 250 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119431794-A Organosilicon tackifier and preparation method and application thereof 杭州之江有机硅化工有限公司 2025-02-14 CN claimed
CN-119100394-A Method for preparing high-purity nano silicon carbide powder by combining microwave heating technology with self-suspension carbothermal reduction technology 绍兴晶彩科技有限公司 2024-12-10 CN claimed
CN-117327281-A Core-shell type organic silicon resin and ink prepared from same for packaging flexible OLED display thin film 江苏广信感光新材料股份有限公司 2024-01-02 CN claimed
CN-115181223-B Low-gloss matte auxiliary agent, preparation method thereof and molded body 铨盛聚碳科技股份有限公司 2023-08-29 CN claimed
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN claimed
CN-114456385-A Preparation method of MDT (methyl phenyl silicone oil) for cosmetics 湖南科技学院 2022-05-10 CN claimed
EP-2628745-B1 Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process SHINETSU CHEMICAL CO (JP) 2015-03-25 EP claimed
US-20120071700-A1 CATALYSTS FOR HYDROGENATION OF UNSATURATED HYDROCARBONS AND PREPARATIONS AND USES THEREOF CHINA PETROLEUM & CHEMICAL CORPORATION (CN) 2012-03-22 US claimed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
US-20260103392-A1 CRYSTALLINE TITANIUM OXIDE CORE-SHELL PARTICLES AND DISPERSION CONTAINING SAME JGC CATALYSTS AND CHEMICALS LTD. (JP) 2026-04-16 US disclosed
EP-4696404-A1 SEPARATION MEMBRANE AND METHOD FOR PRODUCING SAME Hiroshima University (JP) 2026-02-18 EP disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
US-12534377-B2 Carbon-containing alumina powder, resin composition, heat dissipation component, and method for producing carbon-containing alumina powder DENKA COMPANY LIMITED (JP) 2026-01-27 US disclosed
US-20050221227-A1 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same FUJITSU LIMITED (JP) 2005-10-06 US disclosed
US-6949324-B2 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same FUJITSU LIMITED (JP) 2005-09-27 US disclosed
US-6743885-B2 MIXTURE OF POLYSILSESQUIOXANE AND ACID GENERATOR SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-06-01 US disclosed
US-20030211407-A1 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same FUJITSU LIMITED (JP) 2003-11-13 US disclosed
US-20030092854-A1 Resin composition for intermediate layer of three-layer resist SUMITOMO CHEMICAL COMPANY, LIMITED 2003-05-15 US disclosed
EP-0193643-A2 Curable resin composition KABUSHIKI KAISHA TOSHIBA (JP) 1986-09-10 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260103392-A1 CRYSTALLINE TITANIUM OXIDE CORE-SHELL PARTICLES AND DISPERSION CONTAINING SAME STRA6, RAB5IF, CCT4 ADRA2A 2242/4885ADRA2B 2716/4885ADRA2C 3454/4885
US-20260118767-A1 REVERSE PATTERNING PROCESS EFNA1, EPHA4, ETV6 ADRA2A 2541/4885ADRA2B 2820/4885ADRA2C 2932/4885
US-20120071700-A1 CATALYSTS FOR HYDROGENATION OF UNSATURATED HYDROCARBONS AND PREPARATIONS AND USES THEREOF HRH3, HRH2, HRH1 ADRA2A 4130/4885ADRA2B 4189/4885ADRA2C 4414/4885
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SMC1A, SPOUT1, LBR ADRA2A 1179/4885ADRA2B 1452/4885ADRA2C 2129/4885
US-12534377-B2 Carbon-containing alumina powder, resin composition, heat dissipation component, and method for producing carbon-containing alumina powder SEM1, ASH2L, MSI2 ADRA2A 1393/4885ADRA2B 2267/4885ADRA2C 1955/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.