SCHEMBL704366

SCHEMBL704366

CCC(O[SiH3])c1cccc(C)c1C

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA2A P08913 4/20 0.37
ADRA2B P18089 4/20 0.37
ADRA2C P18825 4/20 0.37
ADRA1A P35348 3/20 0.37
ADRA1B P35368 3/20 0.37
TSHR P16473 3/20 0.37
ADRA1D P25100 2/20 0.37
KCNH2 Q12809 2/20 0.37
CYP1A2 P05177 2/20 0.37
CYP3A4 P08684 2/20 0.37
CYP2D6 P10635 2/20 0.37
CYP2C9 P11712 2/20 0.37
TP53 P04637 1/20 0.37
CYP2C19 P33261 1/20 0.37
ESR1 P03372 1/20 0.36
SLC6A2 P23975 2/20 0.36
HTR7 P34969 1/20 0.36
TRPA1 O75762 1/20 0.34
ATM Q13315 1/20 0.34
HTR1B P28222 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL706192 0.87 ADRA2A (0.34) ADRA2AADRA2BADRA2CADRA1AADRA1B
SCHEMBL705169 0.86 ESR1 (0.47) ADRA2AADRA2BADRA2CADRA1ATSHR
SCHEMBL8750381 0.85 ADRA2A (0.37) ADRA2AADRA2BADRA2CADRA1AADRA1B
SCHEMBL23560911 0.79 ADRA2A (0.33) ADRA2AADRA2BADRA2CADRA1AADRA1B
SCHEMBL14582649 0.79 ADRA2A (0.33) ADRA2AADRA2BADRA2CADRA1AADRA1B
SCHEMBL2422880 0.79 ADRA2A (0.33) ADRA2AADRA2BADRA2CADRA1AADRA1B
SCHEMBL106514 0.76 ADRA2A (0.42) ADRA2AADRA2BADRA2CADRA1AADRA1B
SCHEMBL5610783 0.75 ADRA2A (0.41) ADRA2AADRA2BADRA2CADRA1AADRA1B
SCHEMBL715340 0.74 TSHR (0.39) TSHRCYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL702619 0.74 GABRA1 (0.37) TSHRCYP1A2CYP3A4SLC6A2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
EP-0042208-B1 METHOD FOR PRODUCING HYDROPHOBIC REINFORCING SILICA FILLERS DOW CORNING CORPORATION (US) 1985-12-04 EP disclosed
EP-0043640-B1 OPTICALLY CLEAR SILICONE COMPOSITIONS CURABLE TO ELASTOMERS DOW CORNING CORPORATION (US) 1985-10-16 EP disclosed
US-4418165-A POLYDIORGANOSILOXANES AND SILICA FILLER DOW CORNING CORPORATION (US) 1983-11-29 US disclosed
US-4344800-A AGING, BASIC CATALYSTS DOW CORNING CORPORATION (US) 1982-08-17 US disclosed
EP-0042208-A2 Method for producing hydrophobic reinforcing silica fillers DOW CORNING CORPORATION (US) 1981-12-23 EP disclosed
WO-1981003485-A1 METHOD FOR PRODUCING HYDROPHOBIC REINFORCING SILICA FILLERS AND FILLERS OBTAINED THEREBY DOW CORNING (US) 1981-12-10 WO disclosed