Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 6/20 | 0.45 |
| ▸ | GSK3B | P49841 | 9/20 | 0.41 |
| ▸ | PTP4A3 | O75365 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4245334 | 0.74 | PTGS2 (0.53) | PTGS2GSK3B | |
| SCHEMBL4837133 | 0.72 | PTGS2 (0.56) | PTGS2GSK3B | |
| SCHEMBL114611 | 0.70 | PTGS2 (0.67) | PTGS2GSK3B | |
| SCHEMBL2724222 | 0.68 | CA12 (0.48) | PTGS2 | |
| SCHEMBL9474080 | 0.68 | PTGS2 (0.64) | PTGS2GSK3B | |
| SCHEMBL81874 | 0.67 | HTR6 (0.44) | — | |
| Biphenyl SCHEMBL413377 | 0.67 | ALDH1A1 (0.41) | PTGS2 | |
| SCHEMBL18173793 | 0.67 | GSK3A (0.37) | GSK3B | |
| SCHEMBL28945255 | 0.67 | PTGS2 (0.45) | PTGS2GSK3B | |
| SCHEMBL11701505 | 0.66 | AKR1B1 (0.39) | PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0157930-B1 | PROCESS FOR THE PREPARATION OF POLYIMIDE AND POLYISOINDOLO-QUINAZOLINE DIONE RELIEF STRUCTURES | SIEMENS AKTIENGESELLSCHAFT (DE) | 1988-03-23 | — | — | EP | disclosed |
| EP-0157932-B1 | PROCESS FOR THE PREPARATION OF POLYIMIDAZOLE AND POLYIMIDAZOPYRROLONE RELIEF STRUCTURES | SIEMENS AKTIENGESELLSCHAFT (DE) | 1988-03-09 | — | — | EP | disclosed |
| US-4610947-A | Method and manufacturing polyimidazole and polyimidazopyrrolone relief structures | SIEMENS AKTIENGESELLSCHAFT (DE) | 1986-09-09 | — | — | US | disclosed |
| US-4598038-A | Preparation of polyimide and polyisoindoloquinazoline dione relief structures | SIEMENS AKTIENGESELLSCHAFT (DE) | 1986-07-01 | — | — | US | disclosed |
| EP-0157932-A1 | Process for the preparation of polyimidazole and polyimidazopyrrolone relief structures | SIEMENS AKTIENGESELLSCHAFT (DE) | 1985-10-16 | — | — | EP | disclosed |
| EP-0157930-A1 | Process for the preparation of polyimide and polyisoindolo-quinazoline dione relief structures | SIEMENS AKTIENGESELLSCHAFT (DE) | 1985-10-16 | — | — | EP | disclosed |
| EP-0019122-B1 | PROCESS FOR THE PHOTOTECHNICAL PRODUCTION OF RELIEF STRUCTURES | SIEMENS AKTIENGESELLSCHAFT (DE) | 1985-07-31 | — | — | EP | disclosed |
| US-4287294-A | Method for the preparation of relief structures by phototechniques | SIEMENS AKTIENGESELLSCHAFT (DE) | 1981-09-01 | — | — | US | disclosed |
| EP-0019122-A2 | Process for the phototechnical production of relief structures | SIEMENS AKTIENGESELLSCHAFT (DE) | 1980-11-26 | — | — | EP | disclosed |