Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | TYR | P14679 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | KIF11 | P52732 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.37 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.37 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.37 |
| ▸ | SLC22A3 | O75751 | 1/20 | 0.37 |
| ▸ | BCHE | P06276 | 3/20 | 0.36 |
| ▸ | ACHE | P22303 | 3/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL547594 | 0.89 | LMNA (0.67) | TSHRLMNATYRALDH1A1HPGD | |
| SCHEMBL424728 | 0.76 | TSHR (0.73) | TSHRLMNATYRALDH1A1KIF11 | |
| SCHEMBL1764667 | 0.73 | TSHR (0.42) | TSHRLMNATYRALDH1A1KIF11 | |
| SCHEMBL3813164 | 0.70 | TSHR (0.44) | TSHRLMNATYRALDH1A1KIF11 | |
| SCHEMBL5427636 | 0.70 | TSHR (0.71) | TSHRLMNATYRALDH1A1KIF11 | |
| Hydrogen Peroxide SCHEMBL28677809 | 0.70 | LMNA (0.71) | TSHRLMNATYRALDH1A1KIF11 | |
| Methylamine SCHEMBL28294591 | 0.70 | TSHR (0.65) | TSHRLMNATYRALDH1A1KIF11 | |
| SCHEMBL27887360 | 0.69 | TSHR (0.55) | TSHRLMNATYRALDH1A1KIF11 | |
| SCHEMBL3423876 | 0.67 | KIF11 (0.70) | TSHRLMNATYRALDH1A1KIF11 | |
| SCHEMBL26915 | 0.67 | KIF11 (0.70) | TSHRLMNATYRALDH1A1KIF11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1099 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026100410-A1 | IODINE-CONTAINING POLYMERIZABLE COMPOUND AND IODINE-CONTAINING POLYMER | 三菱瓦斯化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12578648-B2 | Rinsing liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| EP-3435158-B1 | ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR PURIFYING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-20250348001-A1 | METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| US-20250321486-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-10-16 | — | — | US | disclosed |
| US-12386265-B2 | Pattern forming method and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2025-08-12 | — | — | US | disclosed |
| EP-4597225-A1 | FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| US-12372873-B2 | Treatment liquid for manufacturing semiconductor, pattern forming method using the same, and method of manufacturing electronic device using the same | FUJIFILM CORPORATION (JP) | 2025-07-29 | — | — | US | disclosed |
| US-20010024765-A1 | Novel process for preparing resists | MERCK PATENT GMBH (DE) | 2001-09-27 | — | — | US | disclosed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | disclosed |
| US-6284427-B1 | Process for preparing resists | CLARIANT FINANCE (BVI) LIMITED (VG) | 2001-09-04 | — | — | US | disclosed |
| EP-0677788-B1 | Radiation-sensitive mixture | CLARIANT FINANCE BVI LTD (VG) | 2000-06-21 | — | — | EP | disclosed |
| EP-0989459-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | Clariant Finance (BVI) Limited (VG) | 2000-03-29 | — | — | EP | disclosed |
| EP-0942329-A1 | NOVEL PROCESS FOR PREPARING RESISTS | Clariant International Ltd. (CH) | 1999-09-15 | — | — | EP | disclosed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | disclosed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | disclosed |
| US-5663035-A | PHOTOSENSITIVE ACID GENERATORS, PHOTORESISTS, CONTROLLING ACID DIFFUSION WITH IODONIUM COMPOUND | HOECHST JAPAN LIMITED (JP) | 1997-09-02 | — | — | US | disclosed |
| EP-0677788-A1 | Radiation-sensitive mixture | HOECHST JAPAN LIMITED (JP) | 1995-10-18 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12578648-B2 | Rinsing liquid and pattern forming method | ALKBH5, GABBR1, DNMT3B | TSHR 617/4885LMNA 3933/4885TYR 3094/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.