Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRSS1 | P07477 | 8/20 | 0.71 |
| ▸ | F2 | P00734 | 3/20 | 0.71 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.71 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.71 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.71 |
| ▸ | PKM | P14618 | 1/20 | 0.71 |
| ▸ | PARP10 | Q53GL7 | 2/20 | 0.60 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.58 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.57 |
| ▸ | LMNA | P02545 | 2/20 | 0.53 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.53 |
| ▸ | MAOA | P21397 | 1/20 | 0.53 |
| ▸ | HGFAC | Q04756 | 2/20 | 0.53 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.52 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.52 |
| ▸ | ACR | P10323 | 6/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL346698 | 1.00 | PRSS1 (0.71) | PRSS1F2PRSS2PRSS3KMT2A | |
| SCHEMBL347429 | 1.00 | PRSS1 (0.71) | PRSS1F2PRSS2PRSS3KMT2A | |
| SCHEMBL3143505 | 0.94 | PRSS1 (0.65) | PRSS1F2PRSS2PRSS3KMT2A | |
| SCHEMBL28283207 | 0.94 | PRSS1 (0.65) | PRSS1F2PRSS2PRSS3KMT2A | |
| SCHEMBL22310501 | 0.94 | PRSS1 (0.65) | PRSS1F2PRSS2PRSS3KMT2A | |
| SCHEMBL10021501 | 0.94 | PRSS1 (0.65) | PRSS1F2PRSS2PRSS3KMT2A | |
| SCHEMBL9148082 | 0.92 | PARP10 (0.68) | PRSS1F2PRSS2PRSS3KMT2A | |
| SCHEMBL8585571 | 0.92 | PRSS1 (0.63) | PRSS1F2PRSS2PRSS3KMT2A | |
| SCHEMBL9003587 | 0.92 | PRSS1 (0.63) | PRSS1F2PRSS2PRSS3KMT2A | |
| SCHEMBL9003865 | 0.92 | F2 (0.63) | PRSS1F2PRSS2PRSS3KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 297 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4628461-A1 | POLY(AMIC ACID) SLURRY FOR OPTICAL FIBERS, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF | Ningbo Boya Poly Advanced Materials Co., Ltd. (CN) | 2025-10-08 | — | — | EP | claimed |
| WO-2025105900-A1 | LOW DIELECTRIC POLYIMIDE FILM USING MONOMER HAVING ESTER GROUP AND MANUFACTURING METHOD THEREOF | 피아이첨단소재 주식회사 | 2025-05-22 | — | — | WO | claimed |
| WO-2025100921-A1 | POLISHING PAD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE BY USING SAME | 에스케이엔펄스 주식회사 | 2025-05-15 | — | — | WO | claimed |
| CN-119978369-A | Polyimide film for optical fiber and preparation method thereof | 宁波博雅聚力新材料科技有限公司 | 2025-05-13 | — | — | CN | claimed |
| US-20250144766-A1 | POLISHING PAD AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME | ENPULSE CO., LTD. (KR) | 2025-05-08 | — | — | US | claimed |
| US-20250144767-A1 | POLISHING PAD WITH EXCELLENT RECYCLABILITY AND PYROLYSIS OIL OBTAINED THEREFROM | ENPULSE CO., LTD. (KR) | 2025-05-08 | — | — | US | claimed |
| EP-4549090-A1 | POLISHING PAD WITH EXCELLENT RECYCLABILITY AND PYROLYSIS OIL OBTAINED THEREFROM | SK enpulse Co., Ltd. (KR) | 2025-05-07 | — | — | EP | claimed |
| CN-119391016-A | Polyimide film and preparation method thereof | 安徽国风新材料股份有限公司 | 2025-02-07 | — | — | CN | claimed |
| US-20250033160-A1 | POLISHING PAD WITH REDUCED DEFECT AND METHOD OF PREPARING A SEMICONDUCTOR DEVICE USING THE SAME | ENPULSE CO., LTD. (KR) | 2025-01-30 | — | — | US | claimed |
| CN-119264868-A | Polyimide mixed glue containing graphite and graphene and preparation process thereof | 李恒飞 | 2025-01-07 | — | — | CN | claimed |
| CN-112745504-B | Poly (imide-ester-amide) copolymer and optical film | 达兴材料股份有限公司 | 2024-01-19 | — | — | CN | claimed |
| CN-111770949-B | Polyimide, polyimide solution composition, polyimide film, and substrate | ＵＢＥ株式会社 | 2024-01-16 | — | — | CN | claimed |
| CN-117384406-A | Transparent polyimide film with high cohesiveness, preparation method and application | 苏州尊尔光电科技有限公司 | 2024-01-12 | — | — | CN | claimed |
| CN-116925352-A | High-transparency low-yellowing high-performance polyamide acid resin and preparation method of polyimide film | 山东理工大学 | 2023-10-24 | — | — | CN | claimed |
| CN-116496623-A | Resin composition, polyimide preparation method and related products | 瑞声科技（南京）有限公司 | 2023-07-28 | — | — | CN | claimed |
| CN-116333310-A | TPI resin and preparation method and application thereof | 广州方邦电子股份有限公司 | 2023-06-27 | — | — | CN | claimed |
| CN-112692725-B | Composition for polishing pad and polishing pad | SKC索密思株式会社 | 2023-05-16 | — | — | CN | claimed |
| US-20210122007-A1 | COMPOSITION FOR POLISHING PAD AND POLISHING PAD | ENPULSE CO., LTD. (KR) | 2021-04-29 | — | — | US | claimed |
| CN-112692725-A | Composition for polishing pad and polishing pad | SKC索密思株式会社 | 2021-04-23 | — | — | CN | claimed |
| US-20210087319-A1 | POLYIMIDE FILM, BLOCK COPOLYMER OF POLYAMIDE ACID, AND METHOD FOR MANUFACTURING THE BLOCK COPOLYMER OF POLYAMIDE ACID | Zhen Ding Technology Co., Ltd. (TW) | 2021-03-25 | — | — | US | claimed |