SCHEMBL107710

SCHEMBL107710

CC(C(=O)OC(C)(C)C)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.34
CA14 Q9ULX7 1/20 0.34
AAK1 Q2M2I8 1/20 0.34
LMNA P02545 1/20 0.33
KMT2A Q03164 1/20 0.33
DGAT1 O75907 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA7 P43166 1/20 0.33
NOS1 P29475 2/20 0.33
APP P05067 1/20 0.33
NOS3 P29474 1/20 0.33
NOS2 P35228 1/20 0.33
APLNR P35414 1/20 0.32
CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12027691 0.80 CA1 (0.39) CA12CA14LMNAKMT2ADGAT1
SCHEMBL13758531 0.77 AAK1 (0.33) CA12CA14AAK1LMNAKMT2A
SCHEMBL21164061 0.77 CA1 (0.35) CA12CA14AAK1LMNAKMT2A
SCHEMBL28357024 0.77 HTT (0.32)
SCHEMBL23130631 0.75 SMN1; SMN2 (0.42) CA12CA14KMT2ACA1CA2
SCHEMBL10710117 0.75 SMN1; SMN2 (0.42) CA12CA14KMT2ACA1CA2
SCHEMBL22883300 0.75 APLNR (0.37) CA12CA14AAK1LMNAKMT2A
SCHEMBL28488080 0.74 CTSS (0.36) CA12CA14LMNAKMT2ADGAT1
SCHEMBL28373630 0.74 NOS1 (0.35) CA12CA14LMNAKMT2ADGAT1
SCHEMBL526638 0.74 NOS1 (0.40) CA12CA14AAK1LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230381332-A1 Deuterated Camptothecin Derivative And Antibody-drug Conjugate Thereof BAILI BIO CHENGDU PHARMACEUTICAL CO LTD (CN) 2023-11-30 US disclosed
US-9116437-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2015-08-25 US disclosed
EP-2460802-B1 TRIFLUOROMETHYLTHIOPHENIUM DERIVATIVE SALTS, PROCESS FOR PRODUCTION THEREOF, AND PROCESS FOR PRODUCTION OF TRIFLUOROMETHYL-CONTAINING COMPOUNDS USING SAME NAGOYA INST TECHNOLOGY (JP) 2014-09-03 EP disclosed
US-8703969-B2 Trifluoromethylthiophenium derivative salt, method for producing the same, and method for producing trifluoromethyl-containing compounds using the same NAGOYA INSTITUTE OF TECHNOLOGY (JP) 2014-04-22 US disclosed
EP-2460802-A1 TRIFLUOROMETHYLTHIOPHENIUM DERIVATIVE SALTS, PROCESS FOR PRODUCITON THEREOF, AND PROCESS FOR PRODUCTION OF TRIFLUOROMETHYL-CONTAINING COMPOUNDS USING SAME Nagoya Institute of Technology (JP) 2012-06-06 EP disclosed
US-20120130090-A1 TRIFLUOROMETHYLTHIOPHENIUM DERIVATIVE SALT, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING TRIFLUOROMETHYL-CONTAINING COMPOUNDS USING THE SAME TOSOH F-TECH, INC. (JP) 2012-05-24 US disclosed
US-20120058427-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-03-08 US disclosed
US-8053161-B2 Improved in line edge roughness not only in ordinary exposure (dry exposure) but also in immersion exposure FUJIFILM CORPORATION (JP) 2011-11-08 US disclosed
US-8017298-B2 Method of forming patterns FUJIFILM CORPORATION (JP) 2011-09-13 US disclosed
US-20110102528-A1 COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2011-05-05 US disclosed
US-20100239978-A1 PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD AND RESIST FILM USING THE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2010-09-23 US disclosed
US-20100203450-A1 PHOTORESIST COMPOSITIONS AND METHODS OF USE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-08-12 US disclosed
US-20080318171-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2008-12-25 US disclosed
US-20080081290-A1 RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOUND FOR USE IN THE SYNTHESIS OF THE RESIN, AND PATTERN-FORMING METHOD USING THE RESIST COMPOSITION FUJIFILM CORPORATION (JP) 2008-04-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110102528-A1 COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND INKJET RECORDING METHOD ARFGAP1, FRG1, RHOA CA12 568/4885CA14 570/4885AAK1 1161/4885
US-20230381332-A1 Deuterated Camptothecin Derivative And Antibody-drug Conjugate Thereof DCTD, CD38, CDA CA12 78/4885CA14 46/4885AAK1 3279/4885
US-20120130090-A1 TRIFLUOROMETHYLTHIOPHENIUM DERIVATIVE SALT, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING TRIFLUOROMETHYL-CONTAINING COMPOUNDS USING THE SAME TST, CBR3, CYP4B1 CA12 3531/4885CA14 2848/4885AAK1 2921/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.