Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Tetrabuthylammonium. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 2/20 | 0.48 |
| ▸ | CA1 | P00915 | 12/20 | 0.44 |
| ▸ | CA2 | P00918 | 12/20 | 0.44 |
| ▸ | HSD17B3 | P37058 | 4/20 | 0.43 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrabuthylammonium SCHEMBL108445 | 0.93 | RARB (0.50) | — | |
| Tetrabuthylammonium SCHEMBL105211 | 0.93 | L3MBTL1 (0.49) | SLC22A1CA1CA2HSD17B3 | |
| Tetrabuthylammonium SCHEMBL1642947 | 0.91 | ALDH1A1 (0.47) | SLC22A1CA1CA2 | |
| Tetrabuthylammonium SCHEMBL3188178 | 0.91 | CA1 (0.60) | SLC22A1CA1CA2 | |
| Tetrabuthylammonium SCHEMBL5874480 | 0.91 | MAPT (0.50) | SLC22A1CA1CA2HSD17B3 | |
| Tetrabuthylammonium SCHEMBL23045178 | 0.91 | CA2 (0.55) | SLC22A1CA2 | |
| Tetrabuthylammonium SCHEMBL108878 | 0.91 | CA2 (0.55) | SLC22A1CA2 | |
| Tetrabuthylammonium SCHEMBL9133294 | 0.90 | L3MBTL1 (0.42) | SLC22A1CA1CA2HSD17B3 | |
| Tetrabuthylammonium SCHEMBL8579564 | 0.89 | CA2 (0.53) | SLC22A1CA2 | |
| Tetrabuthylammonium SCHEMBL9133445 | 0.88 | SLC22A1 (0.38) | SLC22A1CA1CA2HSD17B3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122080408-A | Carbon dioxide-based sulfur-containing terpolymer and preparation method thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-119875089-A | Polyester-carbon dioxide-based polycarbonate-polyester triblock biodegradable elastomer and preparation method thereof | 中山大学 | 2025-04-25 | — | — | CN | claimed |
| CN-119505214-A | Main chain sulfur-containing polycarbonate copolymer solid electrolyte and preparation method thereof | 郑州大学 | 2025-02-25 | — | — | CN | claimed |
| CN-118206730-A | Tetrachlorophthalic anhydride/ethylene oxide/propylene oxide/carbon dioxide tetrapolymer and preparation method thereof | 中山大学 | 2024-06-18 | — | — | CN | claimed |
| JP-58215430-A | — | — | None | — | — | JP | disclosed |
| CN-122080408-A | Carbon dioxide-based sulfur-containing terpolymer and preparation method thereof | — | 2026-05-26 | — | — | CN | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| EP-4592299-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-6011133-A | Laminates of glass or metal and poly(alkylene dicarboxylates) and syntheses thereof | BAYLOR UNIVERSITY (US) | 2000-01-04 | — | — | US | disclosed |
| US-5933693-A | Electroconductive elastic member and electrophotographic apparatus using same | BRIDGESTONE CORPORATION (JP) | 1999-08-03 | — | — | US | disclosed |
| US-5837381-A | MULTILAYER PROTECTIVE COATING; WEAR AND CORROSION RESISTANCE | UNIV BAYLOR (US) | 1998-11-17 | — | — | US | disclosed |
| US-5668224-A | TETRAALKYL- OR TRIALKYLAMMONIUM END GROUPS | BAYLOR UNIVERSITY | 1997-09-16 | — | — | US | disclosed |
| US-5451643-A | PROTECTIVE COATINGS FOR METALS OR GLASS | BAYLOR UNIVERSITY (US) | 1995-09-19 | — | — | US | disclosed |
| WO-1994020296-A1 | POLY (ALKYLENE DICARBOXYLATES) AND SYNTHESES THEREOF | BAYLOR UNIVERSITY (US) | 1994-09-15 | — | — | WO | disclosed |
| JP-S58215430-A | CROSSLINKABLE AND FOAMABLE VINYL CHLORIDE RESIN COMPOSITION | OTSUKA CHEM CO LTD | 1983-12-14 | — | — | JP | disclosed |
| US-4255553-A | COMPRISING A COMPOUND HAVING AT LEAST TWO EPOXY GROUPS, A POLYESTER OR ACRYLIC RESIN, AND A QUARTERNARY AMMONIUM CARBOXYLATE AS CATALYST | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1981-03-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | ASH2L, PUF60, IDUA | SLC22A1 1953/4885CA1 667/4885CA2 1064/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | SLC22A1 4619/4885CA1 1449/4885CA2 2902/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | SLC22A1 2467/4885CA1 964/4885CA2 2105/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.