SCHEMBL10932995

SCHEMBL10932995

COc1cc(C)c(N(C)C)c(C)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.53
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
POLB P06746 1/20 0.47
GAA P10253 1/20 0.47
TSHR P16473 1/20 0.44
CYP3A4 P08684 4/20 0.44
HPGD P15428 2/20 0.41
CALM1 P0DP23 1/20 0.41
CYP1A1 P04798 2/20 0.40
CYP1B1 Q16678 2/20 0.40
FFAR4 Q5NUL3 1/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA7 P43166 1/20 0.38
CA9 Q16790 1/20 0.38
CA14 Q9ULX7 1/20 0.38
ACHE P22303 2/20 0.38
PTPN1 P18031 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2633660 0.77 ALDH1A1 (0.59) ALDH1A1MEN1KMT2AGAATSHR
SCHEMBL12326164 0.77 ALDH1A1 (0.59) ALDH1A1MEN1KMT2APOLBGAA
SCHEMBL22458387 0.75 ALDH1A1 (0.39) ALDH1A1MEN1KMT2APOLBGAA
SCHEMBL10933946 0.75 POLB (0.55) ALDH1A1MEN1KMT2APOLBGAA
SCHEMBL2955343 0.74 ALDH1A1 (0.56) ALDH1A1CYP3A4HPGDCYP1A1CYP1B1
SCHEMBL9020581 0.74 CA12 (0.42) ALDH1A1MEN1KMT2APOLBGAA
Hydrochloric Acid SCHEMBL11308080 0.74 POLB (0.53) ALDH1A1MEN1KMT2APOLBGAA
SCHEMBL60535 0.73 RAPGEF4 (0.43) ALDH1A1MEN1KMT2APOLBGAA
SCHEMBL18970526 0.72 ALDH1A1 (0.53) ALDH1A1GAACYP3A4HPGDCYP1A1
SCHEMBL3749321 0.72 ALDH1A1 (0.53) ALDH1A1POLBTSHRCYP3A4HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0043716-B1 PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING PROCESS USING SAME Hitachi, Ltd. (JP) 1985-04-10 EP claimed
US-4409313-A Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine HITACHI, LTD. (JP) 1983-10-11 US claimed
US-4377630-A COMPRISING AN AROMATIC DIAZONIUM SALT AND N,N-DIALKYL ANILINE SALT HITACHI, LTD. (JP) 1983-03-22 US claimed
EP-0043716-A2 Photosensitive composition and pattern forming process using same Hitachi, Ltd. (JP) 1982-01-13 EP claimed
EP-0043716-B1 PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING PROCESS USING SAME Hitachi, Ltd. (JP) 1985-04-10 EP disclosed
US-4409313-A Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine HITACHI, LTD. (JP) 1983-10-11 US disclosed
US-4377630-A COMPRISING AN AROMATIC DIAZONIUM SALT AND N,N-DIALKYL ANILINE SALT HITACHI, LTD. (JP) 1983-03-22 US disclosed
EP-0043716-A2 Photosensitive composition and pattern forming process using same Hitachi, Ltd. (JP) 1982-01-13 EP disclosed