SCHEMBL11023948

SCHEMBL11023948

C[Si](c1ccccc1)(c1ccccc1)[Si](C)(C)[Si](C)(c1ccccc1)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.44
ESR2 Q92731 1/20 0.44
NR1H2 P55055 2/20 0.35
NR1H3 Q13133 2/20 0.35
TSHR P16473 3/20 0.35
ACHE P22303 2/20 0.35
LMNA P02545 1/20 0.35
ALOX12 P18054 1/20 0.35
MAPT P10636 1/20 0.34
NPC1 O15118 3/20 0.32
RAB9A P51151 3/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
ALDH1A1 P00352 1/20 0.32
CES2 O00748 1/20 0.31
CES1 P23141 1/20 0.31
TP53 P04637 1/20 0.30
MAPK1 P28482 1/20 0.30
CA4 P22748 1/20 0.30
BRD4 O60885 1/20 0.30
BRD2 P25440 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2169977 0.87 ESR1 (0.48) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL242201 0.81 ESR1 (0.44) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL14666537 0.79 ESR1 (0.42) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL10150936 0.79 ESR1 (0.42) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL9138483 0.77 ESR1 (0.41) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL10613820 0.77 ESR1 (0.41) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL787696 0.75 ESR1 (0.44) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL11023990 0.75 ESR1 (0.44) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL439492 0.73 ESR1 (0.48) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL63526 0.73 ESR1 (0.70) ESR1ESR2NR1H2NR1H3TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0043480-B1 PROCESS FOR FORMING METALLIC IMAGES Hitachi, Ltd. (JP) 1985-04-03 EP claimed
US-4347304-A PHOTOSENSITIZATION WITH DISILANES OR ORGANIC COMPOUNDS HAVING COUPLED GERMANIUM OR TIN MOLECULES; PHOTORESISTS; POSITIVES; PLATING HITACHI, LTD. (JP) 1982-08-31 US claimed
EP-0043480-A2 Process for forming metallic images Hitachi, Ltd. (JP) 1982-01-13 EP claimed
EP-0043480-B1 PROCESS FOR FORMING METALLIC IMAGES Hitachi, Ltd. (JP) 1985-04-03 EP disclosed
US-4347304-A PHOTOSENSITIZATION WITH DISILANES OR ORGANIC COMPOUNDS HAVING COUPLED GERMANIUM OR TIN MOLECULES; PHOTORESISTS; POSITIVES; PLATING HITACHI, LTD. (JP) 1982-08-31 US disclosed
EP-0043480-A2 Process for forming metallic images Hitachi, Ltd. (JP) 1982-01-13 EP disclosed