SCHEMBL11025328

SCHEMBL11025328

C[Si](C)([Si](c1ccccc1)(c1ccccc1)c1ccccc1)[Si](C)(C)[Si](C)(C)[Si](C)(C)[Si](C)(C)[Si](C)(C)[Si](c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.42
ESR2 Q92731 1/20 0.42
TSHR P16473 2/20 0.35
GPR3 P46089 2/20 0.35
NR1H2 P55055 2/20 0.34
NR1H3 Q13133 2/20 0.34
LMNA P02545 1/20 0.33
ALOX12 P18054 1/20 0.33
ACHE P22303 1/20 0.33
MAPT P10636 1/20 0.33
SMN1; SMN2 Q16637 2/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL787696 0.97 ESR1 (0.44) ESR1ESR2TSHRGPR3NR1H2
SCHEMBL31711468 0.86 ESR1 (0.41) ESR1ESR2TSHRNR1H2NR1H3
SCHEMBL11025001 0.81 ESR1 (0.38) ESR1ESR2NR1H2NR1H3MAPT
SCHEMBL8384123 0.79 ESR1 (0.44) ESR1ESR2TSHRNR1H2NR1H3
SCHEMBL242095 0.77 ALDH1A1 (0.40) ESR1ESR2TSHRLMNAALOX12
SCHEMBL14666537 0.77 ESR1 (0.42) ESR1ESR2TSHRNR1H2NR1H3
SCHEMBL244122 0.77 ESR1 (0.42) ESR1ESR2TSHRNR1H2NR1H3
SCHEMBL2796775 0.73 ESR1 (0.44) ESR1ESR2TSHRGPR3NR1H2
SCHEMBL11023948 0.73 ESR1 (0.44) ESR1ESR2TSHRNR1H2NR1H3
SCHEMBL2799324 0.73 ESR1 (0.44) ESR1ESR2TSHRGPR3NR1H2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0043480-B1 PROCESS FOR FORMING METALLIC IMAGES Hitachi, Ltd. (JP) 1985-04-03 EP claimed
US-4347304-A PHOTOSENSITIZATION WITH DISILANES OR ORGANIC COMPOUNDS HAVING COUPLED GERMANIUM OR TIN MOLECULES; PHOTORESISTS; POSITIVES; PLATING HITACHI, LTD. (JP) 1982-08-31 US claimed
EP-0043480-A2 Process for forming metallic images Hitachi, Ltd. (JP) 1982-01-13 EP claimed
EP-0043480-B1 PROCESS FOR FORMING METALLIC IMAGES Hitachi, Ltd. (JP) 1985-04-03 EP disclosed
US-4347304-A PHOTOSENSITIZATION WITH DISILANES OR ORGANIC COMPOUNDS HAVING COUPLED GERMANIUM OR TIN MOLECULES; PHOTORESISTS; POSITIVES; PLATING HITACHI, LTD. (JP) 1982-08-31 US disclosed
EP-0043480-A2 Process for forming metallic images Hitachi, Ltd. (JP) 1982-01-13 EP disclosed