Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.45 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | PDE4A | P27815 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | SLC6A6 | P31641 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | BLM | P54132 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | APP | P05067 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5706221 | 0.87 | TSHR (0.52) | TSHRPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL20514341 | 0.85 | TSHR (0.50) | TSHRPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL15412880 | 0.85 | TSHR (0.50) | TSHRPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL11065660 | 0.81 | PTGS1 (0.42) | PTGS1PDE4ALMNASLC6A6CYP2C19 | |
| SCHEMBL13933641 | 0.77 | TSHR (0.41) | TSHRCA2CA9 | |
| SCHEMBL418534 | 0.77 | PTGS1 (0.53) | TSHRPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL7869938 | 0.75 | PTGS1 (0.50) | TSHRPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL28038731 | 0.75 | PTGS1 (0.50) | TSHRPTGS1PDE4ALMNASLC6A6 | |
| SCHEMBL13953934 | 0.74 | TSHR (0.38) | TSHR | |
| SCHEMBL28438799 | 0.74 | ADAM17 (0.36) | PTGS1PDE4ALMNASLC6A6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026087365-A1 | NON-ACIDIC COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER | BASF SE (DE) | 2026-04-30 | — | — | WO | disclosed |
| CN-119121333-A | Composition for cobalt or cobalt alloy electroplating | 巴斯夫欧洲公司 | 2024-12-13 | — | — | CN | disclosed |
| CN-112154228-B | Composition for cobalt or cobalt alloy electroplating | 巴斯夫欧洲公司 | 2024-09-24 | — | — | CN | disclosed |
| CN-118475728-A | Alkaline composition for copper electroplating comprising a defect reducing agent | 巴斯夫欧洲公司 | 2024-08-09 | — | — | CN | disclosed |
| CN-118451219-A | Alkaline composition for copper electroplating comprising a grain refiner | 巴斯夫欧洲公司 | 2024-08-06 | — | — | CN | disclosed |
| EP-3714085-B1 | COMPOSITION FOR COBALT ELECTROPLATING COMPRISING LEVELING AGENT | BASF SE (DE) | 2023-08-09 | — | — | EP | disclosed |
| WO-2023126259-A1 | ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A DEFECT REDUCTION AGENT | BASF SE (DE) | 2023-07-06 | — | — | WO | disclosed |
| WO-2023126257-A1 | ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER | BASF SE (DE) | 2023-07-06 | — | — | WO | disclosed |
| US-20230203695-A1 | Alkaline Composition For Copper Electroplating Comprising A Defect Reduction Agent | BASF SE (DE) | 2023-06-29 | — | — | US | disclosed |
| US-20230203694-A1 | ALKALINE COMPOSITION FOR COPPER ELECTROPLATING COMPRISING A GRAIN REFINER | BASF SE (DE) | 2023-06-29 | — | — | US | disclosed |
| CN-111344438-A | Composition for electroplating cobalt comprising leveling agent | 巴斯夫欧洲公司 | 2020-06-26 | — | — | CN | disclosed |
| US-20190226107-A1 | COMPOSITION FOR COBALT PLATING COMPRISING ADDITIVE FOR VOID-FREE SUBMICRON FEATURE FILLING | BASF SE (DE) | 2019-07-25 | — | — | US | disclosed |
| EP-3485069-A1 | COMPOSITION FOR COBALT PLATING COMPRISING ADDITIVE FOR VOID-FREE SUBMICRON FEATURE FILLING | BASF SE (DE) | 2019-05-22 | — | — | EP | disclosed |
| EP-0025694-B1 | BRIGHT NICKEL PLATING BATH AND PROCESS AND COMPOSITION THEREFOR | M & T CHEMICALS, INC. (US) | 1984-03-28 | — | — | EP | disclosed |
| US-4435254-A | ACETYLENIC AMINES AND SULFONATES | M&T CHEMICALS INC. (US) | 1984-03-06 | — | — | US | disclosed |
| EP-0025694-A1 | Bright nickel plating bath and process and composition therefor | M & T CHEMICALS, INC. (US) | 1981-03-25 | — | — | EP | disclosed |
| US-4178217-A | Zinc electroplating bath | BASF AKTIENGESELLSCHAFT (DE) | 1979-12-11 | — | — | US | disclosed |
| US-4069112-A | UNSATURATED CYCLOSULFONE | M & T CHEMICALS INC. (US) | 1978-01-17 | — | — | US | disclosed |
| US-4046647-A | BETA-SUBSTITUTED, GAMMA-SUBSTITUTED, OR BETA, GAMMA-DISUBSTITUTED SULFONE | M&T CHEMICALS INC. (US) | 1977-09-06 | — | — | US | disclosed |
| US-4022676-A | Alkaline bright zinc electroplating bath | POPESCU FRANCINE | 1977-05-10 | — | — | US | disclosed |