Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | APP | P05067 | 1/20 | 0.37 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.30 |
| ▸ | PDE4A | P27815 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | SLC6A6 | P31641 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | BLM | P54132 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5706221 | 0.94 | TSHR (0.52) | TSHRAPPPTGS1PDE4ALMNA | |
| SCHEMBL15412880 | 0.92 | TSHR (0.50) | TSHRAPPPTGS1PDE4ALMNA | |
| SCHEMBL11079760 | 0.85 | TSHR (0.45) | TSHRAPPPTGS1PDE4ALMNA | |
| SCHEMBL20514337 | 0.82 | CA2 (0.39) | TSHRAPP | |
| SCHEMBL37545 | 0.80 | APP (0.48) | TSHRAPPPTGS1PDE4ALMNA | |
| SCHEMBL20514343 | 0.78 | TSHR (0.44) | TSHRLMNA | |
| SCHEMBL754172 | 0.78 | APP (0.46) | TSHRAPPPTGS1PDE4ALMNA | |
| SCHEMBL419968 | 0.78 | APP (0.46) | TSHRAPPPTGS1PDE4ALMNA | |
| SCHEMBL312671 | 0.78 | APP (0.46) | TSHRAPPPTGS1PDE4ALMNA | |
| SCHEMBL18380848 | 0.78 | APP (0.46) | TSHRAPPPTGS1PDE4ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108291307-B | Plating bath composition and method for electroless plating of palladium | 埃托特克德国有限公司 | 2020-02-14 | — | — | CN | claimed |
| US-10513780-B2 | Plating bath composition and method for electroless plating of palladium | ATOTECH DEUTSCHLAND GMBH (DE) | 2019-12-24 | — | — | US | claimed |
| EP-3380649-B1 | PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM | ATOTECH DEUTSCHLAND GMBH (DE) | 2019-10-30 | — | — | EP | claimed |
| US-20180340260-A1 | PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM | ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) | 2018-11-29 | — | — | US | claimed |
| EP-3380649-A1 | PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM | ATOTECH Deutschland GmbH (DE) | 2018-10-03 | — | — | EP | claimed |
| CN-108291307-B | Plating bath composition and method for electroless plating of palladium | 埃托特克德国有限公司 | 2020-02-14 | — | — | CN | disclosed |
| US-10513780-B2 | Plating bath composition and method for electroless plating of palladium | ATOTECH DEUTSCHLAND GMBH (DE) | 2019-12-24 | — | — | US | disclosed |
| EP-3380649-B1 | PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM | ATOTECH DEUTSCHLAND GMBH (DE) | 2019-10-30 | — | — | EP | disclosed |
| US-20180340260-A1 | PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM | ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) | 2018-11-29 | — | — | US | disclosed |
| EP-3380649-A1 | PLATING BATH COMPOSITION AND METHOD FOR ELECTROLESS PLATING OF PALLADIUM | ATOTECH Deutschland GmbH (DE) | 2018-10-03 | — | — | EP | disclosed |