SCHEMBL1127606

SCHEMBL1127606

c1ccc(CSCc2ccc3ccccc3c2)cc1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.55
LMNA P02545 1/20 0.55
CYP1A2 P05177 2/20 0.52
CYP2A6 P11509 1/20 0.52
KMT2A Q03164 1/20 0.50
ALOX5 P09917 1/20 0.46
HTT P42858 1/20 0.46
ATM Q13315 1/20 0.46
HTR2A P28223 1/20 0.44
HTR2C P28335 1/20 0.44
HTR2B P41595 1/20 0.44
SLC6A2 P23975 1/20 0.42
SLC6A4 P31645 1/20 0.42
SLC6A3 Q01959 1/20 0.42
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
PLAU P00749 1/20 0.42
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31122366 1.00 SMN1; SMN2 (0.55) SMN1; SMN2LMNACYP1A2CYP2A6KMT2A
SCHEMBL9456940 0.94 LMNA (0.60) SMN1; SMN2LMNACYP1A2CYP2A6KMT2A
SCHEMBL8585678 0.86 CYP1A2 (0.52) SMN1; SMN2LMNACYP1A2CYP2A6KMT2A
SCHEMBL19825525 0.85 CYP1A2 (0.54) SMN1; SMN2LMNACYP1A2CYP2A6KMT2A
SCHEMBL5638963 0.80 CYP1A2 (0.56) SMN1; SMN2LMNACYP1A2KMT2AHTT
SCHEMBL206 0.79 CYP2C19 (0.56) SMN1; SMN2CYP1A2NPC1RAB9ACA12
SCHEMBL11188199 0.79 LMNA (0.48) SMN1; SMN2LMNACYP1A2CYP2A6KMT2A
SCHEMBL9866549 0.79 LMNA (0.51) SMN1; SMN2LMNACYP1A2CYP2A6HTR2A
SCHEMBL9009753 0.78 CYP1A2 (0.50) SMN1; SMN2LMNACYP1A2CYP2A6KMT2A
SCHEMBL29402141 0.78 CYP1A2 (0.50) SMN1; SMN2LMNACYP1A2CYP2A6KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4738010-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
EP-4696511-A1 INK-JET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-18 EP disclosed
US-20260042294-A1 INK-JET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042918-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
EP-4691782-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-11 EP disclosed
EP-4691783-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KABUSHIKI KAISHA (JP) 2026-02-11 EP disclosed
EP-4692937-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER Toray Industries, Inc. (JP) 2026-02-11 EP disclosed
EP-4668018-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND SEMICONDUCTOR DEVICE USING THESE Toray Industries, Inc. (JP) 2025-12-24 EP disclosed
US-20250115705-A1 RESIN COMPOSITION FOR LENS, CURED SUBSTANCE FOR LENS, AND LENS MITSUI CHEMICALS, INC. (JP) 2025-04-10 US disclosed
EP-2284165-B1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION SAN APRO LTD (JP) 2013-02-20 EP disclosed
US-20130037753-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE HITACHI CHEMICAL COMPANY, LTD (JP) 2013-02-14 US disclosed
US-8278030-B2 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof SAN-APRO LIMITED (JP) 2012-10-02 US disclosed
EP-2485290-A1 MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE Hitachi Chemical Company, Ltd. (JP) 2012-08-08 EP disclosed
US-20120181530-A1 MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE RESONAC CORPORATION (JP) 2012-07-19 US disclosed
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF SAN-APRO LIMITED (JP) 2011-02-17 US disclosed
EP-2284165-A1 PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION San-Apro Limited (JP) 2011-02-16 EP disclosed
US-7709598-B2 Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex SAN-APRO LIMITED (JP) 2010-05-04 US disclosed
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex SAN-APRO LIMITED (JP) 2007-09-27 US disclosed
EP-1752463-A1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX San-Apro Limited (JP) 2007-02-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT3, OR10J3, RFT1 SMN1; SMN2 3144/4885LMNA 2525/4885CYP1A2 3129/4885
US-20130037753-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE L1CAM, CD99, EPB41L2 SMN1; SMN2 2769/4885LMNA 3265/4885CYP1A2 1880/4885
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF ARSA, ASIC1, TST SMN1; SMN2 1788/4885LMNA 3096/4885CYP1A2 2434/4885
US-20260042294-A1 INK-JET RECORDING HEAD SEM1, ASIC1, C9 SMN1; SMN2 696/4885LMNA 969/4885CYP1A2 3560/4885
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex AS3MT, TTR, PFAS SMN1; SMN2 297/4885LMNA 829/4885CYP1A2 4455/4885
US-20260042918-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT1, MLLT3, ERCC1 SMN1; SMN2 4298/4885LMNA 461/4885CYP1A2 1154/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.