Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CETP | P11597 | 1/20 | 0.41 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.40 |
| ▸ | NPC1 | O15118 | 2/20 | 0.40 |
| ▸ | RAB9A | P51151 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | CES2 | O00748 | 2/20 | 0.40 |
| ▸ | CES1 | P23141 | 2/20 | 0.40 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.40 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.40 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.40 |
| ▸ | NAAA | Q02083 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | PPARG | P37231 | 1/20 | 0.36 |
| ▸ | PPARA | Q07869 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2740822 | 0.80 | CES1 (0.44) | SMN1; SMN2LMNACES2CES1NAAA | |
| SCHEMBL1128516 | 0.77 | KDM4E (0.44) | SMN1; SMN2NPC1RAB9ALMNACES2 | |
| SCHEMBL107173 | 0.75 | CES1 (0.50) | SMN1; SMN2LMNACES2CES1HDAC3 | |
| SCHEMBL106336 | 0.75 | CES1 (0.50) | SMN1; SMN2LMNACES2CES1HDAC3 | |
| SCHEMBL1598481 | 0.74 | CES1 (0.49) | SMN1; SMN2LMNACES2CES1HDAC3 | |
| Bromide SCHEMBL8757443 | 0.74 | CES1 (0.49) | SMN1; SMN2LMNACES2CES1HDAC3 | |
| SCHEMBL1127720 | 0.74 | CES1 (0.49) | SMN1; SMN2LMNACES2CES1HDAC3 | |
| SCHEMBL3440454 | 0.74 | CES1 (0.49) | SMN1; SMN2LMNACES2CES1HDAC3 | |
| SCHEMBL3394492 | 0.73 | CES1 (0.49) | SMN1; SMN2LMNACES2CES1NAAA | |
| Bromide SCHEMBL1046807 | 0.73 | CES2 (0.47) | SMN1; SMN2LMNACES2CES1HDAC3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4696511-A1 | INK-JET RECORDING HEAD | Canon Kabushiki Kaisha (JP) | 2026-02-18 | — | — | EP | disclosed |
| US-20260042917-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20260042294-A1 | INK-JET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20260042918-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4691783-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | CANON KABUSHIKI KAISHA (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4691782-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | Canon Kabushiki Kaisha (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4692937-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER | Toray Industries, Inc. (JP) | 2026-02-11 | — | — | EP | disclosed |
| WO-2025074871-A1 | RESIN, PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCTS OF SAME, AND ELECTRONIC COMPONENT AND DISPLAY DEVICE EACH USING SAID CURED PRODUCT | 東レ株式会社 | 2025-04-10 | — | — | WO | disclosed |
| WO-2025070154-A1 | POLYAMIDE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, AND ELECTRONIC COMPONENT | 東レ株式会社 | 2025-04-03 | — | — | WO | disclosed |
| WO-2025063041-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT USING SAME | 東レ株式会社 | 2025-03-27 | — | — | WO | disclosed |
| EP-2284165-B1 | SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | SAN APRO LTD (JP) | 2013-02-20 | — | — | EP | disclosed |
| US-20130037753-A1 | ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE | HITACHI CHEMICAL COMPANY, LTD (JP) | 2013-02-14 | — | — | US | disclosed |
| US-8278030-B2 | Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof | SAN-APRO LIMITED (JP) | 2012-10-02 | — | — | US | disclosed |
| EP-2485290-A1 | MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE | Hitachi Chemical Company, Ltd. (JP) | 2012-08-08 | — | — | EP | disclosed |
| US-20120181530-A1 | MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE | RESONAC CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | SAN-APRO LIMITED (JP) | 2011-02-17 | — | — | US | disclosed |
| EP-2284165-A1 | PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION | San-Apro Limited (JP) | 2011-02-16 | — | — | EP | disclosed |
| US-7709598-B2 | Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex | SAN-APRO LIMITED (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | SAN-APRO LIMITED (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1752463-A1 | NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX | San-Apro Limited (JP) | 2007-02-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260042917-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | MLLT3, OR10J3, RFT1 | CETP 1370/4885EPHX1 480/4885SMN1; SMN2 3144/4885 |
| US-20130037753-A1 | ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE | L1CAM, CD99, EPB41L2 | CETP 3933/4885EPHX1 520/4885SMN1; SMN2 2769/4885 |
| US-20110039205-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF | ARSA, ASIC1, TST | CETP 4663/4885EPHX1 4155/4885SMN1; SMN2 1788/4885 |
| US-20260042294-A1 | INK-JET RECORDING HEAD | SEM1, ASIC1, C9 | CETP 2949/4885EPHX1 1296/4885SMN1; SMN2 696/4885 |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | AS3MT, TTR, PFAS | CETP 4429/4885EPHX1 4832/4885SMN1; SMN2 297/4885 |
| US-20260042918-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | MLLT1, MLLT3, ERCC1 | CETP 613/4885EPHX1 63/4885SMN1; SMN2 4298/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.