SCHEMBL1127659

SCHEMBL1127659

CCC1(COc2cccc3ccccc23)COC1

nearest known ligand 0.46

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
HTR1B P28222 10/20 0.46
HTR1D P28221 2/20 0.44
SLC6A4 P31645 2/20 0.43
HRH1 P35367 1/20 0.43
TSHR P16473 1/20 0.43
KCNA3 P22001 1/20 0.42
KDM4E B2RXH2 1/20 0.42
ALDH1A1 P00352 1/20 0.42
HPGD P15428 1/20 0.42
TDP1 Q9NUW8 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29366887 1.00 HTR1B (0.46) HTR1BHTR1DSLC6A4HRH1TSHR
SCHEMBL21089714 0.88 TSHR (0.39) TSHRKDM4EALDH1A1HPGDTDP1
SCHEMBL36068 0.86 TSHR (0.41) TSHRALDH1A1
SCHEMBL7197037 0.82 PDE9A (0.48) HTR1BHTR1DSLC6A4HRH1KCNA3
SCHEMBL36031 0.81 TSHR (0.39) TSHRKDM4EALDH1A1HPGD
SCHEMBL29682447 0.81 TSHR (0.39) TSHRKDM4EALDH1A1HPGD
SCHEMBL213521 0.80 ALDH1A1 (0.46) TSHRKDM4EALDH1A1TDP1
SCHEMBL29703117 0.80 ALDH1A1 (0.46) TSHRKDM4EALDH1A1TDP1
SCHEMBL21089715 0.80 PDE9A (0.39) TSHRKDM4EALDH1A1
SCHEMBL15333996 0.79 TSHR (0.37) HRH1TSHRHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4667537-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-12-24 EP disclosed
US-20250382500-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO LTD (JP) 2025-12-18 US disclosed
EP-2216349-B1 USE OF A PHENOL TYPE COMPOUND IN A DENTAL CHEMICAL POLYMERIZATION CATALYST WITH IMPROVED POLYMERIZING ACTIVITY TOKUYAMA DENTAL CORP (JP) 2023-09-20 EP disclosed
EP-3199520-B1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2019-12-25 EP disclosed
US-10059662-B2 Sulfonium salt, photoacid generator, and photosensitive composition TOKYO OHKA KOGYO CO., LTD. (JP) 2018-08-28 US disclosed
US-20170305848-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2017-10-26 US disclosed
EP-3199520-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION Tokyo Ohka Kogyo Co., Ltd. (JP) 2017-08-02 EP disclosed
EP-1190695-B1 Catalyst for chemical polymerization of dental materials TOKUYAMA CORP (JP) 2012-11-14 EP disclosed
US-8278030-B2 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof SAN-APRO LIMITED (JP) 2012-10-02 US disclosed
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF SAN-APRO LIMITED (JP) 2011-02-17 US disclosed
US-6815470-B2 FOR DENTAL RESTORATIVE, DOES NOT CAUSE THE CURED PRODUCT TO BE TINTED OR DISCOLORED TOKUYAMA CORPORATION (JP) 2004-11-09 US disclosed
US-20040006154-A1 Deantal catalyst for chemical polymerization and use thereof IBARAGI KAZUYA (JP) 2004-01-08 US disclosed
US-6660784-B2 Adhesives; mixture of peroxy compounds and tetraphenylborate as catalyst TOKUYAMA CORPORATION (JP) 2003-12-09 US disclosed
EP-1069120-B1 Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound TOAGOSEI CO LTD (JP) 2003-08-13 EP disclosed
US-6469108-B2 REACTING A DIHYDROXYNAPHTHALENE WITH 3-ALKYL-3-CHLOROMETHYLOXETANE OR 3-CHLOROMETHYLOXETANE IN PRESENCE OF ALKALI METAL HYDROXIDE, ALKALI METAL HYDRIDE OR ALKALI METAL TOAGOSEI CO., LTD. (JP) 2002-10-22 US disclosed
US-20020132951-A1 Dental catalyst for chemical polymerization and use thereof TOKUYAMA CORPORATION 2002-09-19 US disclosed
US-20020103330-A1 Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound TOAGOSEI CO., LTD. 2002-08-01 US disclosed
US-6365760-B1 BIS(3-ALKYLOXETAN-3-YL)-METHOXY)BIPHENYL COMPOUNDS USED AS OPTICAL MATERIALS; WORKABILITY; LOW VISCOSITY; HIGH REFRACTIVE INDEX; PHOTO AND THERMOCURING; TOAGOSEI CO., LTD. (JP) 2002-04-02 US disclosed
EP-1190695-A1 Catalyst for chemical polymerization of dental materials TOKUYAMA CORPORATION (JP) 2002-03-27 EP disclosed
EP-1069120-A1 Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound TOAGOSEI CO., LTD. (JP) 2001-01-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040006154-A1 Deantal catalyst for chemical polymerization and use thereof MPO, DBN1, BRD1 HTR1B 3455/4885HTR1D 4239/4885SLC6A4 4068/4885
US-20170305848-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION ARSA, SPIN1, ASIC1 HTR1B 3245/4885HTR1D 3036/4885SLC6A4 1213/4885
US-10059662-B2 Sulfonium salt, photoacid generator, and photosensitive composition ARSA, SPIN1, ASIC1 HTR1B 3245/4885HTR1D 3036/4885SLC6A4 1213/4885
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF ARSA, ASIC1, TST HTR1B 3367/4885HTR1D 4331/4885SLC6A4 1485/4885
US-20020103330-A1 Naphthalene derivative, binaphthalene derivative and biphenyl derivative and cationically curable compound NDC1, BECN1, NUCB2 HTR1B 1933/4885HTR1D 1122/4885SLC6A4 2248/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.