SCHEMBL1127692

SCHEMBL1127692

[O-][S+](c1ccccc1)c1ccc2c(c1)Cc1ccccc1[S+]2[O-]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1127965 0.86
SCHEMBL1128512 0.78
SCHEMBL1128384 0.77
SCHEMBL36333 0.76 MAOA (0.39)
SCHEMBL10476775 0.76 MAOA (0.39)
SCHEMBL9160477 0.76 MAOA (0.39)
SCHEMBL1614828 0.74 TDP2 (0.38)
Hydrochloric Acid SCHEMBL585839 0.74 MAOA (0.37)
Ammonia Solution, Strong SCHEMBL1871983 0.74 MAOA (0.37)
SCHEMBL15411118 0.72 ALDH1A1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12422747-B2 Negative photosensitive resin composition, pattern formation method, and laminated film SAN-APRO LTD. (JP) 2025-09-23 US disclosed
EP-3909943-B1 SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION SAN APRO LTD (JP) 2025-06-04 EP disclosed
US-12129240-B2 Sulfonium salt, photoacid generator, curable composition and resist composition SAN-APRO LTD. (JP) 2024-10-29 US disclosed
US-20230236505-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND LAMINATED FILM SAN-APRO LTD. (JP) 2023-07-27 US disclosed
EP-3480205-B1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTOCURABLE COMPOSITION, AND CURED PRODUCT THEREOF SAN APRO LTD (JP) 2022-04-13 EP disclosed
US-20220089562-A1 SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION SAN-APRO LTD. (JP) 2022-03-24 US disclosed
EP-3909943-A1 SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION San-Apro Ltd. (JP) 2021-11-17 EP disclosed
WO-2020145043-A1 SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION サンアプロ株式会社 2020-07-16 WO disclosed
US-10683266-B2 Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof SAN APRO LTD. (JP) 2020-06-16 US disclosed
US-20190300476-A1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTOCURABLE COMPOSITION, AND CURED PRODUCT THEREOF SAN-APRO LTD. (JP) 2019-10-03 US disclosed
EP-3480205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTOCURABLE COMPOSITION, AND CURED PRODUCT THEREOF San-Apro Ltd. (JP) 2019-05-08 EP disclosed
US-8853290-B2 Photosensitive composition SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2014-10-07 US disclosed
US-20140045966-A1 PHOTOSENSITIVE COMPOSITION. CURED ARTICLE, AND METHOD FOR PRODUCING ACTINICALLY CURED ARTICLE SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2014-02-13 US disclosed
EP-2284165-B1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION SAN APRO LTD (JP) 2013-02-20 EP disclosed
US-8278030-B2 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof SAN-APRO LIMITED (JP) 2012-10-02 US disclosed
US-20120142806-A1 PHOTOSENSITIVE COMPOSITION SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2012-06-07 US disclosed
EP-2441778-A1 PHOTOSENSITIVE COMPOSITION Sanyo Chemical Industries, Ltd. (JP) 2012-04-18 EP disclosed
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF SAN-APRO LIMITED (JP) 2011-02-17 US disclosed
EP-2284165-A1 PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION San-Apro Limited (JP) 2011-02-16 EP disclosed