SCHEMBL1128517

SCHEMBL1128517

O=C(CS)c1ccccc1Cc1cccc2ccccc12

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 4/20 0.54
CYP2C19 P33261 3/20 0.54
CYP1A2 P05177 3/20 0.50
CYP2D6 P10635 2/20 0.50
CYP2C9 P11712 2/20 0.50
TDP1 Q9NUW8 2/20 0.49
PTPN1 P18031 1/20 0.47
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
NR4A1 P22736 1/20 0.44
NR4A2 P43354 1/20 0.44
NR4A3 Q92570 1/20 0.44
ACP3 P15309 1/20 0.44
PLK1 P53350 1/20 0.44
KDM4E B2RXH2 2/20 0.43
LMNA P02545 2/20 0.43
HPGD P15428 2/20 0.43
PTGER4 P35408 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
MTNR1A P48039 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29154501 0.83 CYP3A4 (0.56) CYP3A4CYP2C19CYP1A2CYP2D6CYP2C9
SCHEMBL5804173 0.83 PTPN1 (0.67) CYP3A4CYP1A2CYP2D6CYP2C9TDP1
SCHEMBL28396043 0.81 GPR35 (0.44) CYP3A4CYP2C19CYP1A2CYP2D6CYP2C9
SCHEMBL3817879 0.80 MEN1 (0.61) CYP3A4CYP2C19CYP1A2CYP2D6CYP2C9
SCHEMBL28746958 0.79 CYP3A4 (0.55) CYP3A4CYP2C19CYP1A2CYP2D6CYP2C9
SCHEMBL29490353 0.76 CYP2C19 (0.62) CYP3A4CYP2C19CYP1A2CYP2D6CYP2C9
SCHEMBL599659 0.76 CYP2C19 (0.62) CYP3A4CYP2C19CYP1A2CYP2D6CYP2C9
SCHEMBL29154497 0.76 CYP3A4 (0.56) CYP3A4CYP2C19CYP1A2CYP2D6CYP2C9
SCHEMBL29026501 0.76 CYP2C19 (0.56) CYP3A4CYP2C19CYP1A2CYP2D6CYP2C9
SCHEMBL28396774 0.76 TSHR (0.54) CYP3A4CYP2C19CYP1A2CYP2D6CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4738010-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD CANON KK (JP) 2026-04-30 US disclosed
EP-4696511-A1 INK-JET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-18 EP disclosed
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042918-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042294-A1 INK-JET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
EP-4692937-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER Toray Industries, Inc. (JP) 2026-02-11 EP disclosed
EP-4691782-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-11 EP disclosed
EP-4691783-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KABUSHIKI KAISHA (JP) 2026-02-11 EP disclosed
EP-4668018-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND SEMICONDUCTOR DEVICE USING THESE Toray Industries, Inc. (JP) 2025-12-24 EP disclosed
EP-2284165-B1 SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION SAN APRO LTD (JP) 2013-02-20 EP disclosed
US-20130037753-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE HITACHI CHEMICAL COMPANY, LTD (JP) 2013-02-14 US disclosed
US-8278030-B2 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof SAN-APRO LIMITED (JP) 2012-10-02 US disclosed
EP-2485290-A1 MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE Hitachi Chemical Company, Ltd. (JP) 2012-08-08 EP disclosed
US-20120181530-A1 MATERIAL FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY ELEMENT USING ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATING DEVICE, AND DISPLAY DEVICE RESONAC CORPORATION (JP) 2012-07-19 US disclosed
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF SAN-APRO LIMITED (JP) 2011-02-17 US disclosed
EP-2284165-A1 PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION San-Apro Limited (JP) 2011-02-16 EP disclosed
US-7709598-B2 Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex SAN-APRO LIMITED (JP) 2010-05-04 US disclosed
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex SAN-APRO LIMITED (JP) 2007-09-27 US disclosed
EP-1752463-A1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX San-Apro Limited (JP) 2007-02-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT3, OR10J3, RFT1 CYP3A4 3390/4885CYP2C19 3098/4885CYP1A2 3129/4885
US-20130037753-A1 ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND PRODUCTION METHOD FOR SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE L1CAM, CD99, EPB41L2 CYP3A4 1604/4885CYP2C19 1485/4885CYP1A2 1880/4885
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD ASIC1, PTGER1, PELP1 CYP3A4 823/4885CYP2C19 2081/4885CYP1A2 2364/4885
US-20110039205-A1 SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF ARSA, ASIC1, TST CYP3A4 1880/4885CYP2C19 1690/4885CYP1A2 2434/4885
US-20260042294-A1 INK-JET RECORDING HEAD SEM1, ASIC1, C9 CYP3A4 2620/4885CYP2C19 2738/4885CYP1A2 3560/4885
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex AS3MT, TTR, PFAS CYP3A4 4497/4885CYP2C19 4807/4885CYP1A2 4455/4885
US-20260042918-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT1, MLLT3, ERCC1 CYP3A4 2230/4885CYP2C19 2198/4885CYP1A2 1154/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.