Tetramethylammonium Ion

Tetramethylammonium Ion

SCHEMBL36640

C[N+](C)(C)C.O=P([O-])(O)O

nearest known ligand 0.61

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Known targets — ChEMBL curated mechanism

ADRA1AADRA1BADRA1DADRB1ADRB2ADRB3CYP11B1DPP4FGFR1FGFR2FGFR3FGFR4HRH1JAK1JAK2JAK3KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITNAOPRD1OPRK1OPRM1PPDGFRBPIK3CDSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASMOTYK2polrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Tetramethylammonium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SLC34A1 Q06495 1/20 0.61
CA2 P00918 1/20 0.43
LMNA P02545 3/20 0.35
KDM4E B2RXH2 1/20 0.35
CYP2C19 P33261 1/20 0.35
KMT2A Q03164 1/20 0.35
BBOX1 O75936 2/20 0.35
CHRNB2 P17787 1/20 0.33
CHRNA7 P36544 1/20 0.33
CHRNA4 P43681 1/20 0.33
FDPS P14324 2/20 0.31
GGPS1 O95749 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetramethylammonium Ion SCHEMBL27796484 0.96 SLC34A1 (0.57) SLC34A1CA2LMNAKDM4ECYP2C19
Tetramethylammonium Ion SCHEMBL28147271 0.93 SLC34A1 (0.64) SLC34A1CA2LMNAKDM4ECYP2C19
Tetramethylammonium Ion SCHEMBL36639 0.92 SLC34A1 (0.50) SLC34A1CA2LMNAKDM4ECYP2C19
Tetramethylammonium Ion SCHEMBL27744546 0.88 SLC34A1 (0.47) SLC34A1CA2LMNAKDM4ECYP2C19
Tetramethylammonium Ion SCHEMBL6320658 0.88 SLC34A1 (0.47) SLC34A1CA2LMNAKDM4ECYP2C19
Phosphoric Acid SCHEMBL27235602 0.82
Phosphoric Acid SCHEMBL27983893 0.82
Tetramethylammonium Ion SCHEMBL545336 0.82 CHRNB2 (0.40) SLC34A1LMNABBOX1CHRNB2CHRNA7
Tetramethylammonium Ion SCHEMBL10737257 0.82 CA2 (0.50) SLC34A1CA2LMNAKDM4EBBOX1
Tetramethylammonium Ion SCHEMBL1130116 0.82 SLC34A1 (0.41) SLC34A1CA2LMNAKDM4ECYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 371 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122079810-A Aromatic diamine and polyimide containing amido, preparation method and application thereof 2026-05-26 CN claimed
CN-121528773-B Water-based high-voltage electrolyte, preparation method thereof and supercapacitor Xi'an Thermal Power Research Institute Co.,Ltd. (CN) 2026-05-26 CN claimed
EP-4690281-A1 COMPOSITION FOR TIN HARD MASK REMOVAL WHILE COMPATIBLE WITH TUNGSTEN Versum Materials US, LLC (US) 2026-02-11 EP claimed
US-20260015560-A1 COMPOSITIONS FOR POST-CMP CLEANING OF MICROELECTRONIC DEVICES ENTEGRIS INC (US) 2026-01-15 US claimed
US-20260005029-A1 COMPOSITION, METHOD OF TREATING METAL-CONTAINING LAYER BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-01-01 US claimed
US-20250381519-A1 CO2 CONCENTRATOR AND RELATED MATERIALS, PROCESSES, AND SYSTEMS SUSTEON INC (US) 2025-12-18 US claimed
WO-2025104679-A1 PROCESSES FOR MAKING INTERMEDIATES FOR ISOINDOLINONE INHIBITORS OF THE MDM2-P53 INTERACTION HAVING ANTICANCER ACTIVITY OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2025-05-22 WO claimed
CN-119907401-A Photoelectric device, preparation method thereof and display device TCL科技集团股份有限公司 2025-04-29 CN claimed
CN-119876971-A Acidic CO2Electrolytic process 南京大学 2025-04-25 CN claimed
WO-2024233437-A1 COMPOSITION FOR TIN HARD MASK REMOVAL WHILE COMPATIBLE WITH TUNGSTEN VERSUM MATERIALS US, LLC (US) 2024-11-14 WO claimed
EP-1146014-B1 Mesoporous silica films with mobile ion gettering and accelerated processing APPLIED MATERIALS INC (US) 2005-03-30 EP claimed
US-20040127008-A1 Method for producing integrated microsystems ROBERT BOSCH GMBH (DE) 2004-07-01 US claimed
US-6559070-B1 Mesoporous silica films with mobile ion gettering and accelerated processing APPLIED MATERIALS, INC. 2003-05-06 US claimed
US-6462005-B1 AQUEOUS SOLUTION CONTAINING A QUARTERNARY AMMONIUM SALT, A FLUORO COMPOUND AND OPTIONALLY AN ORGANIC SOLVENT; PROTECTING DEPOSITION FILM TO BE REMOVED; NO CORROSION OF CONDUCTIVE LAYER BEING DECONTAMINATED TEXAS INSTRUMENTS INCORPORATED 2002-10-08 US claimed
EP-1146014-A2 Mesoporous silica films with mobile ion gettering and accelerated processing Applied Materials, Inc. (US) 2001-10-17 EP claimed
US-5972862-A COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT MITSUBISHI GAS CHEMICAL (JP) 1999-10-26 US claimed
EP-0529070-A1 METHODS FOR IMPROVING THE SENSITIVITY OF HYBRIDIZATION ASSAYS AMOCO CORPORATION (US) 1993-03-03 EP claimed
WO-1992015708-A1 METHODS FOR IMPROVING THE SENSITIVITY OF HYBRIDIZATION ASSAYS AMOCO CORPORATION (US) 1992-09-17 WO claimed
US-4522729-A CXONTACTING IMPORITIES WITH TETRAALKYLAMMONIUM SALT PHILLIPS PETROLEUM COMPANY (US) 1985-06-11 US claimed
US-3956171-A Process for preparing stable positively charged alumina coated silica sols and product thereof E. I. DU PONT DE NEMOURS AND COMPANY (US) 1976-05-11 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260015560-A1 COMPOSITIONS FOR POST-CMP CLEANING OF MICROELECTRONIC DEVICES TET2, ASIC1, PIEZO1 SLC34A1 809/4885CA2 793/4885LMNA 2078/4885
US-20260005029-A1 COMPOSITION, METHOD OF TREATING METAL-CONTAINING LAYER BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME SCO2, ASH2L, AOC2 SLC34A1 3724/4885CA2 88/4885LMNA 1995/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.