Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Tetramethylammonium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC34A1 | Q06495 | 1/20 | 0.47 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 3/20 | 0.33 |
| ▸ | BBOX1 | O75936 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL36639 | 0.96 | SLC34A1 (0.50) | SLC34A1CA2LMNABBOX1KDM4E | |
| Tetramethylammonium Ion SCHEMBL27744546 | 0.92 | SLC34A1 (0.47) | SLC34A1CA2LMNABBOX1KDM4E | |
| Tetramethylammonium Ion SCHEMBL36640 | 0.88 | SLC34A1 (0.61) | SLC34A1CA2LMNABBOX1KDM4E | |
| Tetramethylammonium Ion SCHEMBL27796484 | 0.85 | SLC34A1 (0.57) | SLC34A1CA2LMNABBOX1KDM4E | |
| Tetramethylammonium Ion SCHEMBL1204834 | 0.84 | CHRNB2 (0.36) | SLC34A1LMNABBOX1CHRNB2CHRNA7 | |
| Tetramethylammonium Ion SCHEMBL7641461 | 0.84 | CHRNB2 (0.36) | SLC34A1LMNABBOX1CHRNB2CHRNA7 | |
| Phosphoric Acid SCHEMBL6070 | 0.83 | — | — | |
| Tetramethylammonium Ion SCHEMBL28147271 | 0.81 | SLC34A1 (0.64) | SLC34A1CA2LMNABBOX1KDM4E | |
| Phosphoric Acid SCHEMBL10657785 | 0.80 | — | — | |
| Phosphoric Acid SCHEMBL13092 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12547072-B2 | Self-aligned build-up processing | GEMINATIO, INC. (US) | 2026-02-10 | — | — | US | disclosed |
| US-20250336673-A1 | METHODS FOR SUBSTRATE PATTERNING PROCESS | TOKYO ELECTRON LTD (JP) | 2025-10-30 | — | — | US | disclosed |
| US-20250314968-A1 | SELF-ALIGNED DOUBLE PATTERNING USING METAL-BASED RESIST | TOKYO ELECTRON LTD (JP) | 2025-10-09 | — | — | US | disclosed |
| US-20250314969-A1 | SELF-ALIGNED DOUBLE PATTERNING USING METAL-BASED RESIST | TOKYO ELECTRON LTD (JP) | 2025-10-09 | — | — | US | disclosed |
| US-12386261-B2 | In-resist process for high density contact formation | GEMINATIO, INC. (US) | 2025-08-12 | — | — | US | disclosed |
| US-20250233019-A1 | MULTI-LEVEL SELECTIVE PATTERNING FOR STACKED DEVICE CREATION | GEMINATIO, INC. (US) | 2025-07-17 | — | — | US | disclosed |
| US-20250216783-A1 | ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | disclosed |
| US-20250216784-A1 | IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION | GEMINATIO, INC. (US) | 2025-07-03 | — | — | US | disclosed |
| US-20250216763-A1 | ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIFTING AGENT | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | disclosed |
| US-20250216782-A1 | MASKING PROCESS USING SWITCHABLE POLYMER | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | disclosed |
| WO-2023028245-A1 | SELF-ALIGNED BUILD-UP PROCESSING | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | disclosed |
| WO-2023028223-A1 | OPTIMIZATION FOR LOCAL CHEMICAL EXPOSURE | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | disclosed |
| WO-2023028243-A1 | NARROW LINE CUT MASKING PROCESS | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | disclosed |
| EP-3545048-A1 | OIL RECOVERY METHOD | BP Exploration Operating Company Limited (GB) | 2019-10-02 | — | — | EP | disclosed |
| US-20190257182-A1 | Oil Recovery Method | BP EXPLORATION OPERATING COMPANY LIMITED (GB) | 2019-08-22 | — | — | US | disclosed |
| WO-2018095721-A1 | OIL RECOVERY METHOD | BP EXPLORATION OPERATING COMPANY LIMITED (GB) | 2018-05-31 | — | — | WO | disclosed |
| US-20050054134-A1 | Method for manufacturing a microsystem | ROBERT BOSCH GMBH (DE) | 2005-03-10 | — | — | US | disclosed |
| US-6534243-B1 | A coating containing a cleaving compound to trim resist features; permitting a deprotection region to form within an inner portion of the patterned resist; removing coating and deprotection region to provide a second patterned feature | ADVANCED MICRO DEVICES, INC. | 2003-03-18 | — | — | US | disclosed |
| US-6492075-B1 | COATING WITH CLEAVING COMPOUND TO CONTROLLABLY DECREASE SIZE OF DEVELOPED RESIST | ADVANCED MICRO DEVICES, INC. | 2002-12-10 | — | — | US | disclosed |
| US-4904357-A | Production of quaternary ammonium and quaternary phosphonium borohydrides | SOUTHWESTERN ANALYTICAL (US) | 1990-02-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12547072-B2 | Self-aligned build-up processing | MYBBP1A, SMURF1, MYB | SLC34A1 3703/4885CA2 4208/4885LMNA 1133/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.