Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK13 | O15264 | 6/20 | 0.86 |
| ▸ | MAPK12 | P53778 | 6/20 | 0.86 |
| ▸ | MAPK11 | Q15759 | 6/20 | 0.86 |
| ▸ | MAPK14 | Q16539 | 6/20 | 0.86 |
| ▸ | MAPT | P10636 | 5/20 | 0.86 |
| ▸ | RAF1 | P04049 | 4/20 | 0.86 |
| ▸ | TP53 | P04637 | 3/20 | 0.86 |
| ▸ | MEN1 | O00255 | 3/20 | 0.80 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.80 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.80 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.80 |
| ▸ | HPGD | P15428 | 2/20 | 0.80 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.80 |
| ▸ | GLA | P06280 | 1/20 | 0.80 |
| ▸ | GAA | P10253 | 1/20 | 0.80 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.80 |
| ▸ | GFER | P55789 | 1/20 | 0.80 |
| ▸ | NOX1 | Q9Y5S8 | 3/20 | 0.76 |
| ▸ | LMNA | P02545 | 1/20 | 0.69 |
| ▸ | HTT | P42858 | 1/20 | 0.69 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15400046 | 1.00 | MAPK13 (0.86) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL1308320 | 1.00 | MAPK13 (0.86) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL8104080 | 1.00 | MAPK13 (0.86) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL15400824 | 0.94 | NOX1 (0.85) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL8008805 | 0.94 | NOX1 (0.85) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL6469341 | 0.93 | MAPK13 (1.00) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL17133350 | 0.91 | MAPT (0.73) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL11923005 | 0.91 | MAPK13 (0.77) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL3455232 | 0.89 | NOX1 (0.77) | MAPK13MAPK12MAPK11MAPK14MAPT | |
| SCHEMBL15075610 | 0.88 | MAPK13 (0.77) | MAPK13MAPK12MAPK11MAPK14MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1058 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250237947-A1 | Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate | HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD (CN) | 2025-07-24 | — | — | US | claimed |
| CN-120122391-A | Photosensitive resin composition containing photobleachable aminomethylanthracene photosensitizer and application thereof | 湖南初源新材料股份有限公司 | 2025-06-10 | — | — | CN | claimed |
| CN-120065628-A | Photosensitive resin composition containing photobleachable dienyl anthracene photosensitizer and application thereof | 湖南初源新材料股份有限公司 | 2025-05-30 | — | — | CN | claimed |
| CN-120040387-A | Diepoxyalkoxyl anthracene photosensitizer, photo-curing resin composition, photosensitive dry film and application | 湖南初源新材料股份有限公司 | 2025-05-27 | — | — | CN | claimed |
| CN-119916644-A | Photosensitive resin composition containing alkynyl anthracene photosensitizer and application thereof | 湖南初源新材料股份有限公司 | 2025-05-02 | — | — | CN | claimed |
| CN-114755889-B | Dry film resist and photosensitive dry film | 杭州福斯特电子材料有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-119165729-A | Photosensitive resist ink and preparation method of metal grid line | 杭州福斯特电子材料有限公司 | 2024-12-20 | — | — | CN | claimed |
| CN-119148465-A | Photosensitive resin composition, photosensitive dry film and application thereof | 杭州福斯特电子材料有限公司 | 2024-12-17 | — | — | CN | claimed |
| CN-118393813-B | Dry film for electroplated copper column and IC carrier copper column | 湖南初源新材料股份有限公司 | 2024-11-05 | — | — | CN | claimed |
| CN-118871861-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-114660895-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2022-06-24 | — | — | CN | claimed |
| CN-113174040-B | Photopolymerizable monomer and high-resolution high-adhesion LDI dry film resist composed of photopolymerizable monomer | 杭州福斯特电子材料有限公司 | 2022-05-17 | — | — | CN | claimed |
| CN-110488570-B | Photosensitive resin composition and application thereof | 浙江福斯特新材料研究院有限公司 | 2022-03-11 | — | — | CN | claimed |
| CN-106249545-B | It is a kind of can selfreparing photosensitive dry film solder mask | 杭州福斯特应用材料股份有限公司 | 2019-06-25 | — | — | CN | claimed |
| CN-108241259-A | A kind of anti-corrosion agent composition that can directly describe exposure image with good hole masking function | 浙江福斯特新材料研究院有限公司 | 2018-07-03 | — | — | CN | claimed |
| CN-104133342-B | Photosensitive polymer combination, photosensitive element, the forming method of photoresist figure and the manufacture method of printed circuit board (PCB) | 日立化成株式会社 | 2018-01-23 | — | — | CN | claimed |
| CN-107219726-A | A kind of resin combination and purposes | 浙江福斯特新材料研究院有限公司 | 2017-09-29 | — | — | CN | claimed |
| CN-106990673-A | A kind of transparent, photosensitive polyimide resin composition | 浙江福斯特新材料研究院有限公司 | 2017-07-28 | — | — | CN | claimed |
| CN-105511227-A | Dry film resist with good hole shielding function and laminated body thereof | HANGZHOU FIRST PV MAT CO LTD | 2016-04-20 | — | — | CN | claimed |
| EP-2444396-A1 | PHOTOPROTECTIVE COMPOSITION | Apoteknos Para La Piel, S.L. (ES) | 2012-04-25 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250237947-A1 | Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate | PADI2, PADI4, PADI1 | MAPK13 2751/4885MAPK12 2296/4885MAPK11 3018/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.