SCHEMBL1132513

SCHEMBL1132513

CCN(CC(=O)O)c1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.53
TSHR P16473 2/20 0.53
GLA P06280 1/20 0.53
MEN1 O00255 3/20 0.53
KMT2A Q03164 3/20 0.53
NPC1 O15118 1/20 0.53
RAB9A P51151 1/20 0.53
NOX1 Q9Y5S8 1/20 0.53
CNR2 P34972 3/20 0.45
HSD11B1 P28845 1/20 0.45
TAAR1 Q96RJ0 1/20 0.45
TDP1 Q9NUW8 1/20 0.44
GAA P10253 1/20 0.44
MAPT P10636 1/20 0.44
HTT P42858 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
CYP3A4 P08684 2/20 0.43
TP53 P04637 2/20 0.43
CYP1A2 P05177 1/20 0.43
CYP2D6 P10635 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL8226907 0.98 ALDH1A1 (0.52) ALDH1A1TSHRGLAMEN1KMT2A
SCHEMBL12106085 0.91 MEN1 (0.52) ALDH1A1TSHRMEN1KMT2ANPC1
Ether SCHEMBL28628023 0.91 MEN1 (0.46) ALDH1A1TSHRGLAMEN1KMT2A
SCHEMBL7398832 0.89 ALDH1A1 (0.51) ALDH1A1TSHRGLAMEN1KMT2A
SCHEMBL202173 0.87 TDP1 (0.50) ALDH1A1TSHRGLAMEN1KMT2A
SCHEMBL11562585 0.86 ALDH1A1 (0.52) ALDH1A1TSHRGLAMEN1KMT2A
SCHEMBL3349361 0.84 KEAP1 (0.51) ALDH1A1TSHRMEN1KMT2ANPC1
SCHEMBL3141234 0.84 MEN1 (0.50) ALDH1A1TSHRGLAMEN1KMT2A
SCHEMBL8483627 0.84 ESRRG (0.48) ALDH1A1TSHRMEN1KMT2ANPC1
SCHEMBL430658 0.84 TP53 (0.49) ALDH1A1TSHRGLAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 326 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119024642-A Photocurable resin composition, application thereof and photosensitive dry film resist laminate 杭州福斯特电子材料有限公司 2024-11-26 CN claimed
CN-107544207-B Holographic photopolymer based on thiol olefin click reaction 华中科技大学 2020-06-02 CN claimed
US-5710012-A DETECTION OF CHOLESTEROL BY RELEASE OF HYDROGEN PEROXIDE ACTIMED LABORATORIES, INC. (US) 1998-01-20 US claimed
EP-0644887-A1 PROCESS FOR THE PREPARATION OF CLAVULANIC ACID. SMITHKLINE BEECHAM PLC (GB) 1995-03-29 EP claimed
CN-1095069-A Novel process for the preparation and/or purification of clavulanic acid or pharmaceutically acceptable salts or esters thereof SMITHKLINE BEECHAM PLC (GB) 1994-11-16 CN claimed
WO-1993025557-A1 PROCESS FOR THE PREPARATION OF CLAVULANIC ACID SMITHKLINE BEECHAM PLC (GB) 1993-12-23 WO claimed
US-5153236-A Comprising an N-aryl-alpha-amino acid and a photosensitizer such as a thixoanthone, isoalloxazine or coumarine; high sensitivity to UV and visible light; storage stability; photoresists; relief images HITACHI CHEMICAL CO., LTD. (JP) 1992-10-06 US claimed
CN-122095314-A Photosensitive resin laminate, method for forming resist pattern, and method for manufacturing wiring board having conductor pattern 2026-05-26 CN disclosed
CN-115087929-B Alkali-soluble resin, photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for forming wiring pattern 株式会社力森诺科 2026-05-19 CN disclosed
WO-2026100708-A1 PHOTOSENSITIVE RESIN LAMINATE, PHOTOSENSITIVE ELEMENT, AND PATTERN FORMING METHOD 旭化成株式会社 2026-05-15 WO disclosed
CN-114114841-B Photosensitive resin laminate and method for forming resist pattern 旭化成株式会社 2026-05-12 CN disclosed
US-12607931-B2 Photosensitive transfer material, light shielding material, LED array, and electronic apparatus FUJIFILM CORPORATION (JP) 2026-04-21 US disclosed
US-12560867-B2 Photosensitive element and method for producing photosensitive element RESONAC CORPORATION (JP) 2026-02-24 US disclosed
EP-0489767-A1 CCK ANTAGONISTS. BIOMEASURE INC (US) 1992-06-17 EP disclosed
EP-0295044-B1 PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME Hitachi Chemical Co., Ltd. (JP) 1992-04-22 EP disclosed
WO-1991002719-A2 CCK ANTAGONISTS BIOMEASURE, INC. (US) 1991-03-07 WO disclosed
US-4987057-A HIGH SENSITIVITY TO VISIBLE LIGHT RAYS HITACHI CHEMICAL CO., LTD. (JP) 1991-01-22 US disclosed
EP-0295044-A2 Photoinitiator and photopolymerizable composition using the same Hitachi Chemical Co., Ltd. (JP) 1988-12-14 EP disclosed
EP-0017850-B1 N,N-DISUBSTITUTED ETHYLGLYCINE ESTERS, THEIR PREPARATION AND USE, FUNGICIDES CONTAINING THEM AND THEIR PREPARATION BAYER AG (DE) 1982-12-08 EP disclosed
EP-0017850-A1 N,N-disubstituted ethylglycine esters, their preparation and use, fungicides containing them and their preparation BAYER AG (DE) 1980-10-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12560867-B2 Photosensitive element and method for producing photosensitive element TERB1, PRDM9, PRPF8 ALDH1A1 3248/4885TSHR 2750/4885GLA 4810/4885
US-12607931-B2 Photosensitive transfer material, light shielding material, LED array, and electronic apparatus SETD1B, NLRP1, MAP1LC3B ALDH1A1 1082/4885TSHR 2777/4885GLA 4046/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.