SCHEMBL11528756

SCHEMBL11528756

O=C1C=C(c2occ3ccccc23)C(=O)O1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP1 P09874 2/20 0.36
PTPN1 P18031 3/20 0.33
POLB P06746 2/20 0.33
MEN1 O00255 2/20 0.31
KMT2A Q03164 2/20 0.31
MCL1 Q07820 1/20 0.31
ALDH1A1 P00352 2/20 0.31
HSD17B10 Q99714 2/20 0.31
PRKCI P41743 1/20 0.31
PDE4B Q07343 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
MAPT P10636 2/20 0.31
LMNA P02545 1/20 0.31
PAX8 Q06710 1/20 0.31
KDM4E B2RXH2 2/20 0.30
CYP1A2 P05177 1/20 0.30
GLA P06280 1/20 0.30
CYP2C9 P11712 1/20 0.30
HPGD P15428 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8433111 0.77 MAOA (0.47) PARP1PTPN1POLBMEN1KMT2A
SCHEMBL11544154 0.70 PTPN1 (0.56) PTPN1POLBMEN1KMT2AALDH1A1
SCHEMBL4585151 0.69 ALOX5 (0.39) MEN1KMT2AALDH1A1HSD17B10TDP1
Naphthalene SCHEMBL28134279 0.67 BACE1 (0.45) PTPN1POLBMEN1KMT2AALDH1A1
SCHEMBL27546969 0.67 KDM4E (0.33) ALDH1A1KDM4EGAA
SCHEMBL4267265 0.66 ALOX5 (0.34) HSD17B10KDM4ECYP1A2GLACYP2C9
SCHEMBL32670935 0.66 KDM4E (0.37) PTPN1POLBMEN1KMT2AMCL1
SCHEMBL10781014 0.66 ALOX15 (0.33) TDP1
SCHEMBL28757653 0.66 PTPN1 (0.50) PTPN1POLBMEN1KMT2AALDH1A1
SCHEMBL7171844 0.66 ALOX5 (0.33) ALDH1A1HSD17B10MAPTKDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4140606-A Process for preparing a polymerizable (meth) acrylate oligomer SHOWA DENKO K.K. (JP) 1979-02-20 US disclosed
US-4010289-A METHOD OF MANUFACTURING SYNTHETIC RESIN FILM HAVING HIGH WRITABILITY AND PRINTABILITY SHOWA DENKO KABUSHIKI KAISHA (JA) 1977-03-01 US disclosed