SCHEMBL11922932

SCHEMBL11922932

C=Cc1ccc(OC(=O)c2ccccc2S(=O)(=O)O)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 2/20 0.44
▸ CYP1A2 P05177 1/20 0.41
▸ CYP2C9 P11712 1/20 0.41
▸ CYP2C19 P33261 1/20 0.41
▸ HPGD P15428 4/20 0.41
▸ HSD17B10 Q99714 3/20 0.41
▸ ALOX15 P16050 1/20 0.41
▸ MAPT P10636 6/20 0.40
▸ NPSR1 Q6W5P4 1/20 0.39
▸ KDM4E B2RXH2 2/20 0.39
▸ KMT2A Q03164 4/20 0.38
▸ RAB9A P51151 2/20 0.38
▸ CA1 P00915 1/20 0.38
▸ CA2 P00918 1/20 0.38
▸ CA5A P35218 1/20 0.38
▸ CA9 Q16790 1/20 0.38
▸ ALDH1A1 P00352 2/20 0.37
▸ PTK2B Q14289 1/20 0.37
▸ RXFP1 Q9HBX9 1/20 0.37
▸ XBP1 P17861 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11922937 0.88 KMT2A (0.41) TDP1CYP1A2CYP2C9CYP2C19HSD17B10
SCHEMBL8901165 0.83 HSD17B10 (0.58) TDP1CYP1A2CYP2C9CYP2C19HPGD
SCHEMBL9717128 0.81 HPGD (0.47) TDP1CYP1A2CYP2C9CYP2C19HPGD
SCHEMBL29330984 0.79 HPGD (0.49) TDP1CYP1A2CYP2C9HPGDHSD17B10
SCHEMBL9472028 0.79 HPGD (0.67) TDP1CYP2C9CYP2C19HPGDHSD17B10
SCHEMBL29331006 0.78 ALDH1A1 (0.52) TDP1CYP1A2HPGDHSD17B10ALOX15
SCHEMBL9861237 0.78 ALDH1A1 (0.57) TDP1HPGDHSD17B10ALOX15MAPT
Sulfuric Acid SCHEMBL15671146 0.78 KMT2A (0.59) TDP1HPGDMAPTKDM4EKMT2A
SCHEMBL11922912 0.74 TDP1 (0.59) TDP1CYP1A2CYP2C9CYP2C19HPGD
SCHEMBL15589473 0.74 HPGD (0.45) TDP1CYP1A2CYP2C9CYP2C19HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027908-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-01-25 — — US disclosed
US-20120202141-A1 CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST COATED MASK BLANKS AND RESIST PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-09 — — US disclosed
WO-2009113738-A1 ORGANIC-INORGANIC HYBRID COMPOSITION, TRANSPARENT MOLDING, OPTICAL COMPONENT AND LENS FUJIFILM CORPORATION (JP) 2009-09-17 — — WO disclosed
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