SCHEMBL132686

SCHEMBL132686

CCC(C)(C)C(=O)OC1CCCCC1C(C)(C)C

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FKBP1A P62942 4/20 0.35
HMGCR P04035 3/20 0.34
RIPK1 Q13546 2/20 0.34
CCR2 P41597 1/20 0.33
CYP3A4 P08684 3/20 0.32
USP2 O75604 2/20 0.32
ALDH1A1 P00352 2/20 0.32
SLCO1B1 Q9Y6L6 2/20 0.32
TSHR P16473 2/20 0.32
KDM4E B2RXH2 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
NR1I2 O75469 1/20 0.32
ABCB11 O95342 1/20 0.32
NR3C1 P04150 1/20 0.32
PGR P06401 1/20 0.32
ABCB1 P08183 1/20 0.32
ADORA3 P0DMS8 1/20 0.32
CYP2C8 P10632 1/20 0.32
CHRM1 P11229 1/20 0.32
ADRB3 P13945 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6367523 0.89 FKBP1A (0.34) FKBP1AHMGCRCCR2CYP3A4USP2
SCHEMBL18253358 0.85 ALDH1A1 (0.35) FKBP1AHMGCRRIPK1CYP3A4USP2
SCHEMBL18253360 0.84 ALDH1A1 (0.35) HMGCRCYP3A4USP2ALDH1A1SLCO1B1
SCHEMBL10094772 0.83 PDK1 (0.32) FKBP1AHMGCRRIPK1ALDH1A1
SCHEMBL120170 0.83 FKBP1A (0.34) FKBP1AHMGCRRIPK1ALDH1A1
SCHEMBL3434651 0.81 CYP19A1 (0.42) FKBP1AHMGCRCCR2CYP3A4USP2
SCHEMBL12993041 0.81 NPY1R (0.37) FKBP1AHMGCRCCR2CYP3A4USP2
SCHEMBL11920450 0.80 CYP19A1 (0.41) FKBP1AHMGCRCCR2CYP3A4USP2
SCHEMBL17088137 0.80 HMGCR (0.40) FKBP1AHMGCRCCR2ALDH1A1MEN1
SCHEMBL16273465 0.80 CYP19A1 (0.33) HMGCRCYP3A4USP2ALDH1A1SLCO1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9250519-B2 Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method FUJIFILM CORPORATION (JP) 2016-02-02 US disclosed
US-9052594-B2 Positive photosensitive composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2015-06-09 US disclosed
US-20150118621-A1 METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed
US-20150111135-A1 PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD FUJIFILM CORPORATION (JP) 2015-04-23 US disclosed
US-20120058431-A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2012-03-08 US disclosed
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
US-20070172761-A1 Positive photosensitive composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2007-07-26 US disclosed