SCHEMBL11964012

SCHEMBL11964012

COC(=O)C1C=NOC1=O

nearest known ligand 0.31

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.31
ALDH1A1 P00352 2/20 0.31
MIF P14174 2/20 0.30
MAPT P10636 2/20 0.30
MMP2 P08253 1/20 0.30
ANPEP P15144 1/20 0.30
ITGA4 P13612 1/20 0.30
BRD4 O60885 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6873744 0.65 SMN1; SMN2 (0.33) NPSR1ALDH1A1
Hydrochloric Acid SCHEMBL10949169 0.63 DNTT (0.33)
SCHEMBL7180964 0.63
SCHEMBL4768941 0.62 ALDH1A1 (0.32) ALDH1A1
SCHEMBL12975150 0.60 DNTT (0.35) ALDH1A1MAPTITGA4BRD4
SCHEMBL12975072 0.60 DNTT (0.35) ALDH1A1MAPTITGA4BRD4
SCHEMBL23364360 0.59 SETD7 (0.36) ALDH1A1MAPT
SCHEMBL10682082 0.59 ALDH1A1 (0.35) ALDH1A1MIFMAPTMMP2ANPEP
SCHEMBL7929530 0.59 DNTT (0.37) ALDH1A1MMP2ANPEPBRD4
SCHEMBL18684468 0.58 CHRNB2 (0.35) ALDH1A1BRD4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-20110091812-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-21 US disclosed
US-20110091812-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-21 US disclosed