⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9945783 | 0.72 | ALDH1A1 (0.30) | — | |
| SCHEMBL24777658 | 0.55 | — | — | |
| SCHEMBL18845242 | 0.55 | — | — | |
| SCHEMBL19901525 | 0.55 | — | — | |
| SCHEMBL19261082 | 0.55 | — | — | |
| SCHEMBL14488921 | 0.52 | CHRM1 (0.33) | — | |
| SCHEMBL16727303 | 0.51 | OPRK1 (0.33) | — | |
| SCHEMBL20109690 | 0.51 | OPRK1 (0.33) | — | |
| SCHEMBL10035500 | 0.50 | MGAM (0.31) | — | |
| SCHEMBL14488917 | 0.49 | PRKCA (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8771916-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| US-20110236828-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-09-29 | — | — | US | disclosed |