Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AR | P10275 | 2/20 | 0.41 |
| ▸ | NR1H2 | P55055 | 12/20 | 0.40 |
| ▸ | NR1H3 | Q13133 | 12/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | MLYCD | O95822 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.34 |
| ▸ | RORA | P35398 | 1/20 | 0.33 |
| ▸ | RORC | P51449 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8586265 | 0.81 | NR1H2 (0.48) | ARNR1H2NR1H3MEN1ALOX15 | |
| SCHEMBL127323 | 0.75 | NR1H2 (0.43) | ARNR1H2NR1H3MEN1ALOX15 | |
| SCHEMBL11884233 | 0.74 | CES2 (0.48) | ARNR1H2NR1H3MEN1ALOX15 | |
| SCHEMBL5951815 | 0.74 | — | — | |
| Water SCHEMBL1684070 | 0.73 | NR1H2 (0.65) | ARNR1H2NR1H3MLYCDSMN1; SMN2 | |
| SCHEMBL102848 | 0.73 | CES2 (0.40) | TSHRMAPK1 | |
| SCHEMBL10212933 | 0.72 | GABRA1 (0.46) | ARNR1H2NR1H3MEN1ALOX15 | |
| SCHEMBL832913 | 0.72 | NR1H3 (0.47) | ARNR1H2NR1H3MEN1ALOX15 | |
| SCHEMBL23174652 | 0.70 | CES2 (0.39) | TSHRMAPK1 | |
| SCHEMBL29121446 | 0.70 | CES2 (0.39) | TSHRMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8658346-B2 | Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-25 | — | — | US | disclosed |
| US-8329384-B2 | Resist-modifying composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-11 | — | — | US | disclosed |
| US-20110033799-A1 | PATTERN FORMING PROCESS, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST-MODIFYING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20100297563-A1 | RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |