Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP4 | P15090 | 2/20 | 0.40 |
| ▸ | FABP3 | P05413 | 1/20 | 0.40 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2958503 | 0.77 | FABP4 (0.47) | FABP4FABP3FABP5ALDH1A1TDP1 | |
| SCHEMBL2734945 | 0.76 | CYP3A4 (0.43) | MEN1KMT2ASMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL7737489 | 0.76 | FABP4 (0.49) | FABP4FABP3FABP5ALDH1A1TDP1 | |
| SCHEMBL19861151 | 0.74 | ALDH1A1 (0.42) | MEN1KMT2ASMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL547495 | 0.74 | ALDH1A1 (0.42) | MEN1KMT2ASMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL5555737 | 0.74 | FABP4 (0.47) | FABP4FABP3FABP5MEN1KMT2A | |
| SCHEMBL14252042 | 0.74 | ALDH1A1 (0.39) | MEN1KMT2ASMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL547766 | 0.72 | ALDH1A1 (0.53) | MEN1KMT2ASMN1; SMN2ALDH1A1TDP1 | |
| SCHEMBL5552400 | 0.71 | KDM4E (0.58) | FABP4FABP3FABP5MEN1KMT2A | |
| SCHEMBL14252044 | 0.71 | KMT2A (0.41) | MEN1KMT2ASMN1; SMN2ALDH1A1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9086623-B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition and actinic-ray- or radiation-sensitive film | FUJIFILM CORPORATION (JP) | 2015-07-21 | — | — | US | disclosed |
| US-9086623-B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition and actinic-ray- or radiation-sensitive film | FUJIFILM CORPORATION (JP) | 2015-07-21 | — | — | US | disclosed |
| US-8753802-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-8753802-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20130049149-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND ACTINIC-RAY- OR RADIATION-SENSITIVE FILM | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130049149-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND ACTINIC-RAY- OR RADIATION-SENSITIVE FILM | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130045365-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-02-21 | — | — | US | disclosed |
| US-20130045365-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-02-21 | — | — | US | disclosed |
| WO-2011132764-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-10-27 | — | — | WO | disclosed |