SCHEMBL1230677

SCHEMBL1230677

CO[Si](CN1CCCCC1)(OC)OC

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 3/20 0.35
GAA P10253 1/20 0.32
MEN1 O00255 3/20 0.32
KMT2A Q03164 3/20 0.32
ALDH1A1 P00352 2/20 0.32
TDP1 Q9NUW8 1/20 0.32
TSHR P16473 1/20 0.32
CARM1 Q86X55 1/20 0.31
PRMT6 Q96LA8 1/20 0.31
PRMT8 Q9NR22 1/20 0.31
CHRM5 P08912 1/20 0.31
ADRA2C P18825 1/20 0.31
LMNA P02545 1/20 0.31
HTT P42858 1/20 0.30
RECQL P46063 1/20 0.30
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL329641 1.00 HRH3 (0.35) HRH3GAAMEN1KMT2AALDH1A1
SCHEMBL2502895 0.97 CARM1 (0.32) HRH3CARM1PRMT6PRMT8LMNA
SCHEMBL1229552 0.78 CSNK2A2 (0.35) GAAMEN1KMT2AALDH1A1LMNA
SCHEMBL2508441 0.78 HRH3 (0.33) HRH3GAAMEN1KMT2AALDH1A1
SCHEMBL776376 0.78 SMN1; SMN2 (0.40) HRH3ALDH1A1TDP1TSHRHTT
SCHEMBL1995114 0.78 HRH3 (0.33) HRH3GAAMEN1KMT2AALDH1A1
SCHEMBL1459032 0.76 HRH3 (0.42) HRH3MEN1KMT2AALDH1A1CARM1
SCHEMBL2399087 0.76 HRH3 (0.32) HRH3MEN1KMT2AALDH1A1TSHR
SCHEMBL329482 0.76 HRH3 (0.32) HRH3MEN1KMT2AALDH1A1TSHR
SCHEMBL538032 0.76 CYP1A2 (0.35) MEN1KMT2ACHRM5LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9637600-B2 Cross-linkable masses based on organosilicon compounds WACKER CHEMIE AG (DE) 2017-05-02 US claimed
US-9637600-B2 Cross-linkable masses based on organosilicon compounds WACKER CHEMIE AG (DE) 2017-05-02 US disclosed
US-9587042-B2 Process for producing modified conjugated diene-based polymer, modified conjugated diene-based polymer, and polymer composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-03-07 US disclosed
EP-2789656-B1 Crosslinkable compositions based on organosilicon compounds WACKER CHEMIE AG (DE) 2015-04-22 EP disclosed
US-8987373-B2 Crosslinkable compositions based on organosilicon compounds WACKER CHEMIE AG (DE) 2015-03-24 US disclosed
US-8933165-B2 Method for producing modified conjugated diene-based polymer, and method for producing polymer composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-13 US disclosed
US-20140309370-A1 CROSSLINKABLE COMPOSITIONS BASED ON ORGANOSILICON COMPOUNDS WACKER CHEMIE AG (DE) 2014-10-16 US disclosed
EP-2789656-A1 Crosslinkable compositions based on organosilicon compounds Wacker Chemie AG (DE) 2014-10-15 EP disclosed
CN-104098902-A Crosslinkable compositions based on organosilicon compound WACKER CHEMIE AG 2014-10-15 CN disclosed
US-20140088242-A1 METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE-BASED POLYMER, AND METHOD FOR PRODUCING POLYMER COMPOSITION ZEON CORPORATION (JP) 2014-03-27 US disclosed
EP-2367868-B1 CROSS-LINKABLE MASSES BASED ON ORGANOSILICON COMPOUNDS WACKER CHEMIE AG (DE) 2012-11-07 EP disclosed
US-20120252966-A1 PROCESS FOR PRODUCING MODIFIED CONJUGATED DIENE-BASED POLYMER, MODIFIED CONJUGATED DIENE-BASED POLYMER, AND POLYMER COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED 2012-10-04 US disclosed
CN-102257038-A Cross-linkable masses based on organosilicon compounds WACKER CHEMIE AG 2011-11-23 CN disclosed
US-20110245377-A1 CROSS-LINKABLE MASSES BASED ON ORGANOSILICON COMPOUNDS WACKER CHEMIE AG (DE) 2011-10-06 US disclosed
US-20110033799-A1 PATTERN FORMING PROCESS, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST-MODIFYING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-02-10 US disclosed
US-20100297554-A1 RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-25 US disclosed
US-20100297563-A1 RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-25 US disclosed
US-20100209849-A1 PATTERN FORMING PROCESS AND RESIST-MODIFYING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-08-19 US disclosed
US-20100159392-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-24 US disclosed
US-20100086878-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-08 US disclosed