SCHEMBL1229552

SCHEMBL1229552

CO[Si](CN1CCN(C)CC1)(OC)OC

nearest known ligand 0.35

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CSNK2A2 P19784 2/20 0.35
CSNK2B P67870 2/20 0.35
CSNK2A1 P68400 2/20 0.35
CSNK2A3 Q8NEV1 2/20 0.35
MC4R P32245 1/20 0.33
PAOX Q6QHF9 1/20 0.31
LMNA P02545 1/20 0.31
CHKA P35790 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
KDM4E B2RXH2 1/20 0.31
GLA P06280 1/20 0.31
GAA P10253 1/20 0.30
HRH4 Q9H3N8 1/20 0.30
ALDH1A1 P00352 3/20 0.30
USP2 O75604 1/20 0.30
HPGD P15428 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4069891 0.82
SCHEMBL31468630 0.81 CSNK2A2 (0.35) CSNK2A2CSNK2BCSNK2A1CSNK2A3MC4R
SCHEMBL2502895 0.80 CARM1 (0.32) LMNA
SCHEMBL757553 0.79 DRD2 (0.41) LMNAALDH1A1USP2
SCHEMBL1230677 0.78 HRH3 (0.35) LMNAMEN1KMT2AGAAALDH1A1
SCHEMBL329641 0.78 HRH3 (0.35) LMNAMEN1KMT2AGAAALDH1A1
SCHEMBL2384963 0.77 KDM4E (0.33) CSNK2A2CSNK2BCSNK2A1CSNK2A3MC4R
SCHEMBL776376 0.76 SMN1; SMN2 (0.40) KDM4EALDH1A1USP2
SCHEMBL20463568 0.76 CSNK2A2 (0.36) CSNK2A2CSNK2BCSNK2A1CSNK2A3MC4R
SCHEMBL302762 0.76 CSNK2A2 (0.43) CSNK2A2CSNK2BCSNK2A1CSNK2A3PAOX

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4541800-A1 NITROGEN-CONTAINING SILANE COMPOUND AND METHOD FOR PRODUCING SAME Shin-Etsu Chemical Co., Ltd. (JP) 2025-04-23 EP disclosed
US-20250122230-A1 NITROGEN-CONTAINING SILANE COMPOUND AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-04-17 US disclosed
US-8658346-B2 Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-25 US disclosed
US-8426105-B2 Resist-modifying composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-23 US disclosed
US-8367310-B2 Pattern forming process and resist-modifying composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-02-05 US disclosed
US-8329384-B2 Resist-modifying composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-12-11 US disclosed
US-20110033799-A1 PATTERN FORMING PROCESS, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST-MODIFYING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-02-10 US disclosed
US-20100297554-A1 RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-25 US disclosed
US-20100297563-A1 RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-25 US disclosed
US-20100209849-A1 PATTERN FORMING PROCESS AND RESIST-MODIFYING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-08-19 US disclosed
US-20100159392-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-24 US disclosed
US-20100086878-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250122230-A1 NITROGEN-CONTAINING SILANE COMPOUND AND METHOD FOR PRODUCING SAME HRH3, HRH4, OR10J3 CSNK2A2 1279/4885CSNK2B 1388/4885CSNK2A1 1254/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.