Potassium Ion

Potassium Ion

SCHEMBL123125

O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.[K+]

nearest known ligand 0.54

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA2 P00918 14/20 0.54
CA1 P00915 13/20 0.54
MMP1 P03956 3/20 0.54
MMP2 P08253 3/20 0.54
MMP9 P14780 3/20 0.54
MMP8 P22894 3/20 0.54
MMP13 P45452 3/20 0.54
F2 P00734 4/20 0.43
PRSS1 P07477 4/20 0.43
PRSS2 P07478 4/20 0.43
PRSS3 P35030 4/20 0.43
LMNA P02545 1/20 0.33
THRB P10828 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL5066772 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Potassium Ion SCHEMBL4056625 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Potassium Ion SCHEMBL18008475 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Potassium Ion SCHEMBL10523541 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Potassium Ion SCHEMBL4443223 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Potassium Ion SCHEMBL1462864 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Potassium Ion SCHEMBL31125983 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Potassium Ion SCHEMBL11901811 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Potassium Ion SCHEMBL544675 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9
Potassium Ion SCHEMBL18008007 1.00 CA2 (0.54) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3322 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122082061-A Wear-resistant treatment process of all-titanium alloy drill rod 2026-05-26 CN claimed
CN-120661878-B Anti-burning foam extinguishing agent for lithium battery and preparation method thereof Jianke Yunzhi (Shenzhen) Technology Co.,Ltd. (CN) 2026-05-26 CN claimed
CN-122011246-A Polyvinyl butyral resin and preparation method and application thereof 亿光年高分子材料(江苏)有限公司 2026-05-12 CN claimed
EP-4305105-B1 THERMOPLASTIC COMPOSITIONS SHPP GLOBAL TECH BV (NL) 2026-02-18 EP claimed
US-12404368-B2 Reinforced flame retardant polycarbonate compositions with improved melt volume rates SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2025-09-02 US claimed
EP-4342949-B1 POLYCARBONATE COMPOSITION, ARTICLES FORMED THEREFORE, AND METHODS FOR THE MANUFACTURE THEREOF SHPP GLOBAL TECH BV (NL) 2025-07-23 EP claimed
EP-4342950-B1 POLYCARBONATE COMPOSITION, ARTICLES FORMED THEREFROM, AND METHODS FOR THE MANUFACTURE THEREOF SHPP GLOBAL TECH BV (NL) 2025-07-02 EP claimed
US-20250179296-A1 THERMOPLASTIC COMPOSITIONS SHPP GLOBAL TECH BV (NL) 2025-06-05 US claimed
CN-120059712-A Microemulsion type thick oil viscosity reducer and preparation method and application thereof 胜利油田物华化工厂 2025-05-30 CN claimed
CN-120023526-A Preparation process of high-strength gas-shielded welding wire and high-strength gas-shielded welding wire 德州圣祥金属制品有限公司 2025-05-23 CN claimed
US-20030229165-A1 Process for preparing a fire resistant polycarbonate composition SABIC GLOBAL TECHNOLOGIES B.V. (NL) 2003-12-11 US claimed
US-20030040443-A1 Functional fluids with servo valve erosion resistance EXXONMOBIL RESEARCH & ENGINEERING COMPANY 2003-02-27 US claimed
US-6010834-A Photographic final rinse processing solution and method of use EASTMAN KODAK COMPANY (US) 2000-01-04 US claimed
US-5952158-A REDUCTION IN BASE-SIDE PROCESSING DEFECTS (SCUM, DRYING LINES, SPOTS); NONIONIC POLYETHOXYLATED, NON-FLUORINATED SURFACTANT OR ANIONIC NON-FLUORINATED SULFATE OR SULFONATE SURFACTANT, SECOND FLUORINATED NONIONIC OR ANIONIC SURFACTANT EASTMAN KODAK COMPANY (US) 1999-09-14 US claimed
US-5417832-A Separation membranes THE UNIVERSITY OF COLORADO FOUNDATION, INC. (US) 1995-05-23 US claimed
US-5242973-A Trihalophenoxy terminated polycarbonate resin composition containing salt of organic sulfonic acid IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1993-09-07 US claimed
EP-0523036-A4 ANTICORROSIVE MICROBICIDE 1993-03-10 EP claimed
EP-0523036-A1 ANTICORROSIVE MICROBICIDE. MINNTECH CORP (US) 1993-01-20 EP claimed
WO-1991015122-A1 ANTICORROSIVE MICROBICIDE MINNTECH CORPORATION (US) 1991-10-17 WO claimed
US-4267879-A Method for forming Glauber's salt crystals of reduced size by including a fluorine-containing surfactant GENERAL ELECTRIC COMPANY (US) 1981-05-19 US claimed