SCHEMBL12376734

SCHEMBL12376734

C=C(C)C(=O)Oc1ccc([S+]2CCCC2)c2ccccc12

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.39
TSHR P16473 2/20 0.35
PKM P14618 2/20 0.35
RAB9A P51151 2/20 0.35
NPC1 O15118 1/20 0.35
NPSR1 Q6W5P4 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
ALDH1A1 P00352 3/20 0.35
SMN1; SMN2 Q16637 3/20 0.35
GAA P10253 3/20 0.35
KMT2A Q03164 5/20 0.34
ATM Q13315 1/20 0.34
LMNA P02545 3/20 0.33
HTT P42858 2/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
MAPT P10636 2/20 0.32
HSD17B10 Q99714 2/20 0.31
PGR P06401 1/20 0.31
PTGS1 P23219 1/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3870181 0.83 HSD17B10 (0.42) TSHRPKMRAB9ANPC1NPSR1
SCHEMBL30226858 0.83 ELANE (0.51) ELANETSHRPKMRAB9ANPC1
SCHEMBL15302940 0.83 ELANE (0.51) ELANETSHRPKMRAB9ANPC1
SCHEMBL3872104 0.80 TYMS (0.45) TSHRNPSR1TDP1ALDH1A1SMN1; SMN2
SCHEMBL3871523 0.80 TSHR (0.33) TSHRPKMRAB9ANPC1NPSR1
SCHEMBL3870709 0.80 ELANE (0.36) ELANETSHRPKMRAB9ANPC1
SCHEMBL3872145 0.78 ALDH1A1 (0.37) ELANETSHRALDH1A1SMN1; SMN2GAA
SCHEMBL30544384 0.77 IDO1 (0.47) NPC1ALDH1A1SMN1; SMN2KMT2ALMNA
SCHEMBL15302579 0.77 PLK1 (0.50) ELANETSHRPKMRAB9ANPC1
SCHEMBL135116 0.77 IDO1 (0.47) NPC1ALDH1A1SMN1; SMN2KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170205709-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-20 US disclosed
US-20170205709-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-07-20 US disclosed
US-20170108774-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-20 US disclosed
US-20170108774-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-20 US disclosed
US-20170108775-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-20 US disclosed
US-20170075217-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-16 US disclosed
US-20170075217-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-16 US disclosed
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed
US-20110159431-A1 PHOTOACID GENERATORS AND LITHOGRAPHIC RESISTS COMPRISING THE SAME UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE 2011-06-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110159431-A1 PHOTOACID GENERATORS AND LITHOGRAPHIC RESISTS COMPRISING THE SAME ASIC1, ALAD, ASIC3 ELANE 2266/4885TSHR 3769/4885PKM 2575/4885
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS RPS4Y1, ETV6, RPS4X ELANE 288/4885TSHR 3175/4885PKM 3578/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.