Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 2/20 | 0.36 |
| ▸ | PCSK9 | Q8NBP7 | 1/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | CES2 | O00748 | 2/20 | 0.34 |
| ▸ | CES1 | P23141 | 2/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.34 |
| ▸ | ESR1 | P03372 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.33 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4578147 | 0.91 | DNM1 (0.39) | LTA4HCES2CES1SMN1; SMN2SIGMAR1 | |
| Water SCHEMBL9245728 | 0.90 | DNM1 (0.38) | LTA4HCES2CES1SMN1; SMN2SIGMAR1 | |
| Hydrochloric Acid SCHEMBL9342824 | 0.90 | MEN1 (0.41) | LTA4HMAPTCES2CES1SMN1; SMN2 | |
| SCHEMBL5074633 | 0.85 | DNM1 (0.35) | ALDH1A1CES2CES1SMN1; SMN2TP53 | |
| SCHEMBL11305722 | 0.85 | DNM1 (0.35) | ALDH1A1CES2CES1SMN1; SMN2TP53 | |
| SCHEMBL1481192 | 0.79 | LTA4H (0.38) | LTA4HPCSK9PTGS2CES2CES1 | |
| SCHEMBL3201160 | 0.79 | LTA4H (0.38) | LTA4HPCSK9PTGS2CES2CES1 | |
| SCHEMBL779932 | 0.76 | CES2 (0.37) | LTA4HPCSK9PTGS2CES2CES1 | |
| SCHEMBL9760714 | 0.76 | CES2 (0.37) | LTA4HPCSK9PTGS2CES2CES1 | |
| SCHEMBL30828004 | 0.76 | CES2 (0.37) | LTA4HPCSK9PTGS2CES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170153545-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-01 | — | — | US | disclosed |
| US-20150301451-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-22 | — | — | US | disclosed |
| US-20110165521-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-07 | — | — | US | disclosed |